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Epitaxial growth of Co_2FeAl_(0.5)Si_(0.5) thin films on MgO substrates: Structural, magnetic, and transport properties

机译:MgO基板上的CO_2FEAL_(0.5)Si_(0.5)薄膜的外延生长:结构,磁性和运输性能

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Full-Heusler alloy Co_2FeAl_(0.5)Si_(0.5) (CFAS) has been proposed as a promising candidate to become a robust half-metallic ferromagnet (HFM) even at room temperature (RT), because its E_F is theoretically predicted to lie at the middle of the minority gap, which enhances the temperature stability of the spin polarization [1, 2]. A large TMR ratio of 220 percent at RT has been reported recently by Tezuka et al. in a full-epitaxial CFAS/MgO/CFAS MTJ fabricated on a Cr-buffered MgO (001) substrate [3]. However, the Cr buffer impedes a highly L2_1-ordered CFAS structure due to the Cr interdiffusion by high temperature annealing. In this study, we achieved a highly L2_1-ordered full-Heusler alloy CFAS thin film using an MgO buffer layer instead of the Cr buffer layer, and investigated its structure, magnetic and transport properties as a function of post-annealing temperature.
机译:已经提出了整个Heusler合金Co_2Feal_(0.5)Si_(0.5)(0.5)即使在室温(RT)中也是一个有希望的候选者,因为它是理论上预测其E_F的e_f少数差距的中间,增强了自旋极化的温度稳定性[1,2]。最近通过Tezuka等人报道了RT的大TMR比率为220%。在CR缓冲MgO(001)衬底上制造的全外延CFAS / MgO / CFAS MTJ [3]。然而,CR缓冲器由于CR通过高温退火而导致高度L2_1订购的CFAS结构。在这项研究中,我们使用MgO缓冲层代替Cr缓冲层实现了高度L2_1订购的全Heusler合金CFA薄膜,并作为退火后温度的函数研究其结构,磁性和运输性能。

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