Demonstration of phase-shift masks for extreme-ultraviolet lithography

摘要

We report on a method to produce any type of phase-shift masks for EUV lithography. We have successfully fabricated an unattenuated phase-shift mask consisting of phase patterns and confirmed the expected performance of such a mask through resist printing at λ=13.3 nm. Finally actinic metrology reveals that these etched-multilayer masks, left without a capping layer, tend to degrade over time.