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Conference on Emerging Lithographic Technologies

召开年：2008
召开地：San Jose,CA(US)
出版时间：-

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1.MAGIC: a European programto push the insertion of maskless lithography

机译：魔术：推动掩模光刻插入的欧洲计划
- 作者：L. Pain;B. Icard;S. Tedesco;B. Kampherbeek;G. Gross;C. Klein;H. Loeschner;E.Platzgummer;R. Morgan;S. Manakli;J. Kretz;C. Holhe;K-H Choi;F. Thrum;E.Kassel
- 会议名称：《Conference on Emerging Lithographic Technologies》 | 2008年
- E-Beam;
- lithography;
- multi beam;
- mask less;
2.Lithium debris removal by sputtering and evaporation for EUV optics and applications

机译：通过溅射和EUV光学和应用蒸发去除锂碎片
- 作者：M. J. Neumann;M. J. Cruce;D.N. Ruzic
- 会议名称：《Conference on Emerging Lithographic Technologies》 | 2008年
- EUVL;
- Optics;
- Debris mitigation;
- Lithium;
- Secondary plasma;
3.Applying photolithography-friendly design to e-beam direct writing for 65-nm node and beyond

机译：将光刻辅助设计应用于65-NM节点的电子束直接写入
- 作者：Hiromi Hoshino;Kozo Ogino;Yasuhide Machida;Masaaki Miyajima;Takashi Maruyama;Yoshinori Kojima;Shinji Sugatani
- 会议名称：《Conference on Emerging Lithographic Technologies》 | 2008年
- Maskless lithography;
- E-beam exposure;
- Photolithography;
- Lithography simulation;
- Low volume production;
4.E-Beam direct write alignment strategies for the next generation node

机译：下一代节点的电子束直接写入对齐策略
- 作者：H. Alves;P. Hahmann;K.-H. Kliem;U. Weidenmueller;S. Jahr;C. G. Frase;D. Gnieser;H. Bosse;R. Zimmermann;C. Arndt
- 会议名称：《Conference on Emerging Lithographic Technologies》 | 2008年
- E-beam direct write;
- alignment marks;
- Monte Carlo simulations;
- alignment repeatability;
- overlay;
5.High Resolution Nanoimprint Templates for Dual Damascene —Fabrication and Imprint Results

机译：用于双层镶嵌的高分辨率纳米视图模板和印记结果
- 作者：Mathias Irmscher;Joerg Butschke;Ron Carpio;Brook Chao;Wei-Lun Jen;Corinna Koepernik;Lorenz Nedelmann;Jordan Owens;Frank Palmieri;Marcus Pritschow;Christian Reuter;Holger Sailer;Ken Sotoodeh;Jeff Wetzel;Bruce Wilks;Grant Willson
- 会议名称：《Conference on Emerging Lithographic Technologies》 | 2008年
- UV Nanoimprint;
- Dual Damascene;
- Template;
- E-Beam;
- CAR;
- VSB;
6.Selete's EUV program: progress and challenges

机译：Selete的EUV计划：进步和挑战
- 作者：Ichiro Mori;Osamu Suga;Hiroyuki Tanaka;Iwao Nishiyama;Tsuneo Terasawa;Hiroyuki Shigemura;Takao Taguchi;Toshihiko Tanaka;Toshiro Itani
- 会议名称：《Conference on Emerging Lithographic Technologies》 | 2008年
- EUV lithography;
- EUV mask;
- EUV resist;
- exposure tool;
- flare;
- actinic inspection;
- defect inspection;
- defectrepair;
7.Sub-wavelength optical diffraction and photoacoustic metrologies forthe characterisation of nanoimprinted structures

机译：亚波长光学衍射和光声学算术，纳米修印结构的表征
- 作者：T. Kehoe;J. Bryner;V. Reboud;N. Kehagias;S. Landis;C. Gourgon;J. Vollmann;J. Dual;C.M. Sotomayor Torres
- 会议名称：《Conference on Emerging Lithographic Technologies》 | 2008年
- nanoimprint lithography;
- metrology;
- subwavelength;
- diffraction grating;
- photoacoustic;
- polymer patterning;
8.Submicron patterning on Flexible Substrates by Reduction Optical Lithography

机译：通过减少光学光刻在柔性基板上图案化亚微米
- 作者：Wim J. M. de Laat;Maria Peter;Francois Furthner;Peter T. M. Giesen;Cheng-Qun Gui;Erwin R. Meinders
- 会议名称：《Conference on Emerging Lithographic Technologies》 | 2008年
- Flexible electronics;
- optical lithography;
- flexible substrates;
- thin film transistor on foil;
9.Performance of the Full Field EUV Systems

机译：全场EUV系统的性能
- 作者：Hans Meiling;Edwin Boon;Nico Buzing;Kevin Cummings;Olav Frijns;Judy Galloway;Mieke Goethals;Noreen Harned;Bas Hultermans;Roel de Jonge;Bart Kessels;Peter Kurz;Sjoerd Lok;Martin Lowisch;Joerg Mailman
- 会议名称：《Conference on Emerging Lithographic Technologies》 | 2008年
- EUV lithography;
- system performance;
- tin sources;
- resist images;
- devices;
- high volume manufacturing;
10.Film Quantum Yields of EUV Ultra-High PAG Photoresists

机译：EUV和超高PAG光致抗蚀剂的薄膜量子产率
- 作者：Elsayed Hassanein;Craig Higgins;Patrick Naulleau;Richard Matyi;Gregg Gallatin;Gregory Denbeaux;Alin Antohe;Jim Thackeray;Kathleen Spear;Charles Szmanda;Christopher N. Anderson;Dimitra Niakoula;Matthew Malloy;Anwar Khurshid;Cecilia Montgomery;Emil C. Piscani
- 会议名称：《Conference on Emerging Lithographic Technologies》 | 2008年
- EUV;
- Film Quantum Yield;
- EUV-2D;
- Base Titration;
- Photoresists;
- Ultrahigh PAG Resists;
11.Ionic Debris Assessment of Various EUVL Systems

机译：各种EUVL系统的离子碎片评估
- 作者：C. H. Castano;D. N. Ruzic;S. N. Srivastava;K. C. Thompson;J. Sporre
- 会议名称：《Conference on Emerging Lithographic Technologies》 | 2008年
- ESA;
- Ion Debris Measurement;
- EUV;
- flux;
- diagnostic;
12.Dependence of EUV Mask Printing Performanceon Blank Architecture

机译：EUV掩模印刷绩效件空白架构的依赖性
- 作者：Rik Jonckheere;Yoonsuk Hyun;Fumio Iwamoto;Bart Baudemprez;Jan Hermans;Gian Francesco Lorusso;Ivan Pollentier;Anne-Marie Goethals;Kurt Ronse
- 会议名称：《Conference on Emerging Lithographic Technologies》 | 2008年
- EUV lithography;
- full field;
- EUV reticle;
- imaging performance;
- mask stack;
- absorber;
- capping layer;
13.Dual Damascene BEOL processing using multilevel step and flash imprint lithography

机译：使用多级步骤和闪光印迹光刻的双层镶嵌BEOL处理
- 作者：Brook H. Chao;Frank Palmieri;Wei-Lun Jen;D. Hale McMichael;C. Grant Willson;Jordan Owens;Rich Berger;Ken Sotoodeh;Bruce Wilks;Joseph Pham;Ronald Carpio;EdLa Belle;Jeff Wetzel
- 会议名称：《Conference on Emerging Lithographic Technologies》 | 2008年
- nanoimprint lithography;
- S-FIL;
- dual damascene;
- interconnect;
- SIM;
14.EUV Source Collector

机译：EUV源收集器
- 作者：Norbert R. Boewering;Alex I. Ershov;William F. Marx;Oleh V. Khodykin;Bjoern A. M. Hansson;Ernesto Vargas L.;Juan A. Chavez;Igor V. Fomenkov;David W. Myers;David C. Brandt;SPIE-The International Society for Optical Engineering
- 会议名称：《Conference on Emerging Lithographic Technologies》 | 2006年
- EUV collector mirror;
- EUV lithography;
- EUV light source;
- laser-produced plasma;
- multilayer mirror;
- EUV radiation power;
- collector lifetime;
15.Schwarzschild-Objective-Based EUV Micro Exposure Tool

机译：基于Schwarzschild-目标的EUV微曝光工具
- 作者：Uwe Detlef Zeitner;Torsten Feigl;Tino Benkenstein;SPIE-The International Society for Optical Engineering
- 会议名称：《Conference on Emerging Lithographic Technologies》 | 2006年
- EUV;
- EUV lithography;
- schwarzschild objective;
- micro exposure tool;
- EUV microscopy;
16.Increasing effective resolution through surface conditioners for 1x imprint templates, and photo mask applications beyond 65nm

机译：通过表面调节器提高有效分辨率，对于1x版本的模板，以及超过65nm的照片掩模应用
- 作者：Kosta S. Selinidis;John G. Maltabes;Madhukar B. Rao;Peng Zhang
- 会议名称：《Conference on Emerging Lithographic Technologies》 | 2006年
- Pattern collapse;
- surface conditioner;
- surfactant;
- photo mask;
- imprint template;
17.High-power low cost drive laser for LPP source

机译：用于LPP源的高功率低成本驱动激光器
- 作者：Igor V. Fomenkov;Bjorn A. Hansson;Norbert R. Bowering;Alex I. Ershov;William N. Partlo;Vladimir B. Fleurov;Oleh V. Khodykin;Alexander N. Bykanov;Curtis L. Rettig;Jerzy R. Hoffman
- 会议名称：《Conference on Emerging Lithographic Technologies》 | 2006年
- EUV source;
- laser-produced plasma;
- XeF power amplifier;
- Nd: YLF seed;
- CO_2 laser amplifer;
18.Micro-stereo-lithography system

机译：微立体光刻系统
- 作者：T. Yoshimoto;I. Miyaki;H. Yaze;Y. Maruka;N. Ri;T. Teramoto;K. Morohoshi;Y. Koyagi
- 会议名称：《Conference on Emerging Lithographic Technologies》 | 2006年
- micro-stereo-lithography;
- 3D-structure-photo-polymerizing polyer;
- rapid prototyping system;
- MEMS;
- micro turbine;
- micro coil;
- photonic crystal;
- medical fields;
19.Compact source and beam delivery system for EUV radiation

机译：用于EUV辐射的紧凑型源和光束输送系统
- 作者：Klaus Mann;Frank Barkusky;Armin Bayer;Christian Peth;Holger Tottgerot
- 会议名称：《Conference on Emerging Lithographic Technologies》 | 2006年
- Schwarzschild objective;
- EUV source;
- EUV optics;
- 13.5 nm;
- laser-induced plasma;
- Mo/Si;
- photo-ablation;
- PMMA;
20.Impact of Multi-Layer Deposition Method on Defects for EUVL Photomask Blanks

机译：多层沉积法对EUVL光掩模坯料缺陷的影响
- 作者：Jerry Cullins;Kumi Motai;Iwao Nisiyama;SPIE-The International Society for Optical Engineering
- 会议名称：《Conference on Emerging Lithographic Technologies》 | 2006年
- mask;
- photomask;
- multi-layer deposition;
- defects;
- ion beam;
- magnetron;
21.Study of the dynamic evolution and spectral properties of multi-component plasmas for EUV production

机译：EUV生产多组分等离子体动态演化和光谱特性研究
- 作者：Joshua B. Spencer;Shailendra N. Srivastava;Darren A. Alman;Erik L. Antonsen;David N. Ruzic;Joseph J. MacFarlane;SPIE-The International Society for Optical Engineering
- 会议名称：《Conference on Emerging Lithographic Technologies》 | 2006年
22.Schwarzschild-objective-based EUV micro-exposure tool

机译：基于Schwarzschild-目标的EUV微曝光工具
- 作者：Uwe D. Zeitner;Torsten Feigl;Tino Benkenstein;Christoph Damm;Thomas Peschel;Norbert Kaiser;Andreas Tunnermann
- 会议名称：《Conference on Emerging Lithographic Technologies》 | 2006年
- EUV;
- EUV lithography;
- Schwarzschild objective;
- micro exposure tool;
- EUV microscopy;
23.Combined absorber stack for optimization of the EUVL mask

机译：组合吸收器堆栈，用于优化EUVL面膜
- 作者：Seung Yoon Lee;Tae Geun Kim;Chung Yong Kim;In-Yong Kang;Yong-Chae Chung;Jinho Ahn;SPIE-The International Society for Optical Engineering
- 会议名称：《Conference on Emerging Lithographic Technologies》 | 2006年
- EUVL;
- absorber;
- absorber stack;
- ARC;
- reflectivity;
- Al_2O_3;
- TaN;
- capping;
- buffer;
24.Combined absorber stack for optimization of the EUVL mask

机译：组合吸收器堆栈，用于优化EUVL面膜
- 作者：Seung Y. Lee;Tae G. Kim;Chung Y. Kim;In-Yong Kang;Yong-Chae Chung;Jinho Ahn
- 会议名称：《Conference on Emerging Lithographic Technologies》 | 2006年
- EUVL;
- absorber;
- absoerber stack;
- ARC;
- reflectivity;
- Al_2O_3;
- TaN;
- capping;
- buffer;
25.Studies on cryogenic Xe capillary jet target for laser-produced plasma EUV-light source

机译：激光产生等离子体EUV光源低温XE毛细管射流的研究
- 作者：T. Inoue;P.E. Nica;K. Kaku;A. Shimoura;S. Amano;S. Miyamoto;T. Mochizuki;SPIE-The International Society for Optical Engineering
- 会议名称：《Conference on Emerging Lithographic Technologies》 | 2006年
- Xe capillary jet;
- mass-limited target;
- debris-free;
- fast-supplying;
- laser-produced plasma EUV source;
26.Micro-Stereo-Lithography System

机译：微立体光刻系统
- 作者：T. Yoshimoto;I. Miyaki;H.Yaze;Y. Maruka;N.Ri;T.Teramoto;K. Morohoshi;Y. Koyagi;SPIE-The International Society for Optical Engineering
- 会议名称：《Conference on Emerging Lithographic Technologies》 | 2006年
- micro-stereo-lithography;
- 3D-structure;
- photo-polymerizing polymer;
- rapid prototyping system;
- MEMS;
- micro turbine;
- micro coil;
- photonic crystal;
- maskless;
- nano imprint;
- nano particle mixing;
27.Soft lithography using perfluorinated polyether molds and PRINT technology for fabrication of 3D arrays on glass substrates

机译：使用全氟化聚醚模具的软光刻和用于在玻璃基板上制造3D阵列的印刷技术
- 作者：Kenton B. Wiles;Natasha S. Wiles;Kevin P. Herlihy;Benjamin W. Maynor;Jason P. Rolland;Joseph M. DeSimone
- 会议名称：《Conference on Emerging Lithographic Technologies》 | 2006年
- Soft Lithography;
- Perfluorpolyether;
- Polydimethylsioxane;
- Self Assembled Monolayer;
- 3-D Array;
28.Soft Lithography Using Perfluorinated Polyether Molds and PRINT Technology for Fabrication of 3-D Arrays on Glass Substrates

机译：使用全氟化聚醚模具的软光刻和用于在玻璃基板上制造3-D阵列的印刷技术
- 作者：Kenton B. Wiles;Natasha S. Wiles;Kevin P. Herlihy;Benjamin W. Maynor;Jason P. Rolland;Joseph M. DeSimone;SPIE-The International Society for Optical Engineering
- 会议名称：《Conference on Emerging Lithographic Technologies》 | 2006年
- soft lithography;
- perfluoropolyether;
- polydimethylsiloxane;
- self assembled monolayer;
- 3-D array;
29.A year in the life of an immersion lithography alpha tool at Albany NanoTech

机译：Albany Nanotech的浸入式光刻alpha工具的一年
- 作者：Michael Tittnich;John G. Hartley;Greg Denbeaux;Uzo Okoroanyanwu;Harry Levinson;Karen E. Petrillo;Chris Robinson;Dario Gil;Dan Corliss;David Back
- 会议名称：《Conference on Emerging Lithographic Technologies》 | 2006年
30.Characterization of CCD sensor for actinic mask blank inspection

机译：光化面膜空白检查CCD传感器的特征
- 作者：Yoshihiro Tezuka;Toshihiko Tanaka;Tsuneo Terasawa;Toshihisa Tomie
- 会议名称：《Conference on Emerging Lithographic Technologies》 | 2006年
- EUV;
- mask blanks;
- actinic inspectioin;
- BI-CCD;
- point spread function;
- readout noise;
31.Characterization of CCD sensor for actinic mask blank inspection

机译：光化面膜空白检查CCD传感器的特征
- 作者：Yoshihiro Tezuka;Toshihiko Tanaka;Tsuneo Terasawa;Toshihisa Tomie;SPIE-The International Society for Optical Engineering
- 会议名称：《Conference on Emerging Lithographic Technologies》 | 2006年
- EUV;
- mask blanks;
- actinic inspection;
- BI-CCD;
- point spread function;
- readout noise;
32.Studies on cryogenic Xe capillary jet target for laser-produced plasma EUV-light source

机译：激光产生等离子体EUV光源低温XE毛细管射流的研究
- 作者：T. Inoue;P. E. Nica;K. Kaku;A. Shimoura;S. Amano;S. Miyamoto;T. Mochizuki
- 会议名称：《Conference on Emerging Lithographic Technologies》 | 2006年
- Xe capillary jet;
- Mass-limited target;
- Debris-free;
- Fast-supplying;
- Laser-produced plasma EUV source;
33.Multi-level Step and Flash Imprint Lithography for Direct Patterning of Dielectrics

机译：用于直接图案化电介质的多级步骤和闪光印记光刻
- 作者：Frank Palmieri;Michael D. Stewart;Jeff Wetzel;Jianjun Hao;Yukio Nishimura;Kane Jen;Colm Flannery;Bin Li;Huang-Lin Chao;Soo Young;Woon Chun Kim;Paul S. Ho;C. Grant Willson;SPIE-The International Society for Optical Engineering
- 会议名称：《Conference on Emerging Lithographic Technologies》 | 2006年
- SFIL;
- dual damascene;
- dielectric;
- ILD;
- interconnect;
- nanoimprint lithography;
34.Characterization of large off-axis EUV mirrors with high accuracy reflectometry at PTB

机译：PTB高精度反射镜的大型轴向EUV镜的表征
- 作者：Christian Laubis;Christian Buchholz;Andreas Fischer;Sven Ploger;Frank Scholz;Heike Wagner;Frank Scholze;Gerhard Ulm;Hartmut Enkisch;Stephan Mullender
- 会议名称：《Conference on Emerging Lithographic Technologies》 | 2006年
- Extreme ultraviolet;
- lithography;
- at-wavelength characterization;
- reflectometry;
- synchrotron radation;
35.Increasing effective resolution through surface conditioners for 1x imprint templates, and photo mask applications beyond 65nm

机译：通过表面调节器提高有效分辨率，对于1x版本的模板，以及超过65nm的照片掩模应用
- 作者：Kosta S. Selinidis;John G. Maltabes;Madhukar B. Rao;Peng Zhang;SPIE-The International Society for Optical Engineering
- 会议名称：《Conference on Emerging Lithographic Technologies》 | 2006年
- pattern collapse;
- surface conditioner;
- surfactant;
- photo mask;
- imprint template;
36.EUV source collector

机译：EUV源收集器
- 作者：Norbert R. Bowering;Alex I. Ershov;William F. Marx;Oleh V. Khodykin;Bjorn A. Hansson;Ernesto Vargas L.;Juan A. Chavez;Igor V. Fomenkov;David W. Myers;David C. Brandt
- 会议名称：《Conference on Emerging Lithographic Technologies》 | 2006年
- EUV collector mirror;
- EUV lithography;
- EUV light source;
- laser-prduced plasma;
- multilayer mirror;
- EUV radiation power;
- collector lifetime;
37.Characterization of large off-axis EUV mirrors with high accuracy reflectometry at PTB

机译：PTB高精度反射镜的大型轴向EUV镜的表征
- 作者：Christian Laubis;Christian Buchholz;Andreas Fischer;Sven Ploeger;Frank Scholz;Heike Wagner;Frank Scholze;Gerhard Ulm;Hartmut Enkisch;Stephan Muellender;Marco Wedowski;Eric Louis;Erwin Zoethout;SPIE-The International Society for Optical Engineering
- 会议名称：《Conference on Emerging Lithographic Technologies》 | 2006年
- extreme ultraviolet;
- metrology;
- lithography;
- at-wavelength characterization;
- reflectometry;
- synchrotron radiation;
38.EUV testing of multilayer mirrors: critical issues

机译：多层镜子的EUV测试：关键问题
- 作者：S. B. Hill;I. Ermanoski;S. Grantham;C. Tarrio;T. B. Lucatorto;T. E. Madey;S. Bajt;M. Chandhok;P. Yan;O. Wood
- 会议名称：《Conference on Emerging Lithographic Technologies》 | 2006年
- extreme ultraviolet;
- lithorgraphy;
- reflectomety;
- EUV optics;
- ruthenium films;
- lifetime testing;
39.A simple lithographic method for fabricating micro/nano multiscale structures

机译：一种简单的制造微型/纳米多尺度结构的平版方法
- 作者：Hoon Eui Jeong;Sung Hoon Lee;Pilnam Kim;Jae Kwan Kim;Kahp Y. Suh
- 会议名称：《Conference on Emerging Lithographic Technologies》 | 2006年
- Multiscale fabrication;
- hierarchical structure;
- micro/nano structure;
- capillary molding;
40.Study of the dynamic evolution and spectral properties of multi-component plasmas for EUV production

机译：EUV生产多组分等离子体动态演化和光谱特性研究
- 作者：Joshua B. Spencer;Shailendra N. Srivastava;Darren A. Alman;Erik L. Antonsen;David N. Ruzic;Joseph J. MacFarlane
- 会议名称：《Conference on Emerging Lithographic Technologies》 | 2006年
41.EUV Sources for the Alpha-Tools

机译：EUV源的alpha-tools
- 作者：Joseph Pankert;Rolf Apetz;Klaus Bergmann;Marcel Damen;Guenther Derra;Oliver Franken;Maurice Janssen;Jeroen Jonkers;Juergen Klein;Helmar Kraus;Thomas Kruecken;Andreas List;SPIE-The International Society for Optical Engineering
- 会议名称：《Conference on Emerging Lithographic Technologies》 | 2006年
- EUV source;
- gas discharge plasma;
- tin;
- EUV lithography;
- halogen cycle;
42.High-temperature LPP collector mirror

机译：高温LPP收集器镜
- 作者：Torsten Feigl;Sergiy Yulin;Nicolas Benoit;Norbert Kaiser;Norbert R. Bowering;Alex I. Ershov;Oleh V. Khodykin;ohn W. Viatella;Kent Bruzzone;Igor V. Fomenkov
- 会议名称：《Conference on Emerging Lithographic Technologies》 | 2006年
- Collector mirror;
- thermal stability;
- multilayer coating;
- optics lifetime;
43.EUV sources for the alpha-tools

机译：EUV源的alpha-tools
- 作者：Joseph Pankert;Rolf Apetz;Klaus Bergmann;Marcel Damen;Gunther Derra;Oliver Franken;Maurice Janssen;Jeroen Jonkers;Jurgen Klein;Helmar Kraus
- 会议名称：《Conference on Emerging Lithographic Technologies》 | 2006年
- EUV source;
- gas discharge plasmas;
- tin;
- EUV Lithography;
- halogen cycle;
44.Multi-level step and flash imprint lithography for direct patterning of dielectrics

机译：用于直接图案化电介质的多级步骤和闪光印记光刻
- 作者：Frank Palmieri;Michael D. Stewart;Jeff Wetzel;Jianjun Hao;Yukio Nishimura;Kane Jen;Colm Flannery;Bin Li;Huang-Lin Chao;Soo Young
- 会议名称：《Conference on Emerging Lithographic Technologies》 | 2006年
- SFIL;
- dual damascene;
- dielectric;
- ILD;
- interconnect;
- nanoimprint lithography;
45.High Power Low Cost Drive Laser for LPP Source

机译：用于LPP源的高功率低成本驱动激光器
- 作者：Igor V. Fomenkov;Bjoern A.M. Hansson;Norbert R. Boewering;Alex I. Ershov;William N. Partlo;Vladimir B. Fleurov;Oleh V. Khodykin;Alexander N. Bykanov;Curtis L. Rettig;Jerzy R. Hoffman;Ernesto Vargas L.;Juan A. Chavez;William F. Marx;SPIE-The International Society for Optical Engineering
- 会议名称：《Conference on Emerging Lithographic Technologies》 | 2006年
- EUV source;
- laser-produced plasma;
- XeF power amplifier;
- Nd:YLF seed;
- CO_2 laser amplifier;
46.Impact of multi-layer deposition method on defects for EUVL photomask blanks

机译：多层沉积法对EUVL光掩模坯料缺陷的影响
- 作者：Jerry Cullins;Kumi Motai;Iwao Nisiyama
- 会议名称：《Conference on Emerging Lithographic Technologies》 | 2006年
- Mask;
- Photomask;
- Multi-Layer Deposition;
- Defects;
- Ion Beam;
- Magnetron;
47.EUV testing of multilayer mirrors: critical issues

机译：多层镜子的EUV测试：关键问题
- 作者：S. B. Hill;I. Ermanoski;S. Grantham;C. Tarrio;T. B. Lucatorto;T. E. Madey;S. Bajt;M. Chandhok;P. Yan;O. Wood;S. Wurm;N. V. Edwards;SPIE-The International Society for Optical Engineering
- 会议名称：《Conference on Emerging Lithographic Technologies》 | 2006年
- extreme ultraviolet;
- lithography;
- reflectometry;
- EUV optics;
- ruthenium films;
- lifetime testing;
48.A Year in the Life of an Immersion Lithography Alpha Tool at Albany NanoTech

机译：Albany Nanotech的浸入式光刻alpha工具的一年
- 作者：Michael Tittnich;John Hartley;Greg Denbeaux;Uzo Okoroanyanwu;Harry Levinson;Karen Petrillo;Chris Robinson;Dario Gil;Dan Corliss;David Back;Stefan Brandl;Christian Schwarz;Frank Goodwin;Yayi Wei;Brian Martinick;Richard Housley;Peter Benson;SPIE-The International Society for Optical Engineering
- 会议名称：《Conference on Emerging Lithographic Technologies》 | 2006年
49.A simple lithographic method for fabricating micro/nano multiscale structures

机译：一种简单的制造微型/纳米多尺度结构的平版方法
- 作者：Hoon Eui Jeong;Sung Hoon Lee;Pilnam Kim;Jae Kwan Kim;Kahp Y. Suh;SPIE-The International Society for Optical Engineering
- 会议名称：《Conference on Emerging Lithographic Technologies》 | 2006年
- multiscale fabrication;
- hierarchical structure;
- micro/nano structure;
- capillary molding;
50.High-Temperature LPP Collector Mirror

机译：高温LPP收集器镜
- 作者：Torsten Feigl;Sergiy Yulin;Nicolas Benoit;Norbert Kaiser;Norbert R. Boewering;Alex I. Ershov;Oleh V. Khodykin;John W. Viatella;Kent A. Bruzzone;Igor V. Fomenkov;David W. Myers;SPIE-The International Society for Optical Engineering
- 会议名称：《Conference on Emerging Lithographic Technologies》 | 2006年
- collector mirror;
- thermal stability;
- multilayer coatings;
- optics lifetime;
51.Fabrication and test of nano crossbar switches/MOSFET hybridcircuits by imprinting lithography

机译：压印光刻纳米横杆开关/ MOSFET杂交窗的制造和测试
- 作者：Zhiyong Li;Xuema Li;Douglas A. A. Ohlberg;Joseph Straznicky;Wei Wu;Zhaoning Yu;Julien Borghetti;William Tong;Duncan Stewart;R. Stanley Williams
- 会议名称：《Conference on Emerging Lithographic Technologies》 | 2008年
- parallel wires;
- hybrid logic circuits;
- FETs;
52.Low density targets for laser-produced-plasma (LPP) extremeul traviolet light source with high-CE and toward high-repetition supply

机译：具有高CE和高重复供应的激光制造 - 等离子体（LPP）remoteul光源的低密度靶标
- 作者：Keiji Nagai;Liqin Ge;Pejun Cai;Cao Pan;ZhongZe Gu;Takayoshi Norimatsu;Hiroaki Nishimura;Katsunobu Nishihara;Noriaki Miyanaga;Yasukazu Izawa;Kunioki Mima
- 会议名称：《Conference on Emerging Lithographic Technologies》 | 2008年
- extreme ultraviolet (EUV);
- laser produced plasma (LPP);
- tin;
- lithium;
- xenon;
- low density;
53.Quantitative measurement of outgas products from EUV photoresists

机译：从EUV光致抗蚀剂的utgas产品的定量测量
- 作者：C. Tarrio;B. A. Benner;R. E. Vest;S. Grantham;S. B Hill;T. B. Lucatorto;J. H.Hendricks;P. Abbott;G. Denbeaux;C.Mbanaso
- 会议名称：《Conference on Emerging Lithographic Technologies》 | 2008年
- Extreme ultraviolet lithography;
- EUV optics;
- resist outgassing;
- carbon growth;
- optics lifetime;
54.Extreme ultraviolet resist outgassing and its effect on nearby optics

机译：极端紫外线抵抗偏粘和其对附近光学的影响
- 作者：Gregory Denbeaux;Rashi Garg;Chimaobi Mbanaso;Justin Waterman;Leonid Yankulin;Alin Antohe;Yu-Jen Fan;Warren Montgomery;Kim Dean;Kevin Orvek;Andrea Wiiest;Obert Wood;Chiew-Seng Koay
- 会议名称：《Conference on Emerging Lithographic Technologies》 | 2008年
- Extreme ultraviolet;
- EUV;
- outgassing;
- optics contamination;
- witness plate;
55.Diffraction feature of micro lens array with a small aperture size

机译：小孔径尺寸微透镜阵列的衍射特征
- 作者：Seungryong Park;Jinho Park;Hakyu Choi;Young-Je Yun;Kwangseon Choi;Jeahee Kim
- 会议名称：《Conference on Emerging Lithographic Technologies》 | 2008年
- CIS;
- micro lens;
- electro-magnetic wave;
- diffraction limit;
56.Advanced Diffuser Technology Helps Reduce Vent-Up Times WhileMaintaining Wafer Integrity on Vacuum Tools Loadlock Chambers

机译：先进的扩散器技术有助于减少触及真空工具的晶圆完整性的透气次数，Loadlock Chambers
- 作者：Chris Vroman;Chris Quartaro
- 会议名称：《Conference on Emerging Lithographic Technologies》 | 2008年
- Wafer throughput;
- loadlocks;
- SWLL;
- 200mm tools;
- CVD;
- PVD;
- RTP Epi;
57.Development status of projection optics and illumination opticsfor EUV1

机译：投影光学和照明OPTICS的开发状态为EUV1
- 作者：Katsuhiko Murakami;Tetsuya Oshino;Hiroyuki Kondo;Hiroshi Chiba;Hideki Komatsuda;Kazushi Nomura;Hiromitsu Iwata
- 会议名称：《Conference on Emerging Lithographic Technologies》 | 2008年
- EUVL;
- Projection Optics;
- Illumination Optics;
- Aspheric mirrors;
- Multilayer coatings;
58.CO _2laser-produced Sn-plasma source for high-volumemanufacturing EUV lithography

机译：CO _2Laser制造的SN-等离子源，用于高卷制造的EUV光刻
- 作者：Akira Endo;Hideo Hoshino;Takashi Suganuma;Krzysztof Nowak;Tatsuya Yanagida;Takayuki Yabu;Takeshi Asayama;Yoshifumi Ueno;Masato Moriya;Masaki Nakano;Hiroshi Someya;Toshihiro Nishisaka;Tamotsu Abe;Georg Soumagne;Hiroshi Komori;Koichi Toyoda
- 会议名称：《Conference on Emerging Lithographic Technologies》 | 2008年
- EUV light source;
- laser produced plasma;
- CO_2laser;
59.Multilayer optics with spectral purity layers for the EUV wavelength range

机译：具有频谱纯度层的多层光学器件，用于EUV波长范围
- 作者：E. Louis;R.W.E. van de Kruijs;A.E. Yakshin;S. Alonso van der Westen;F. Bijkerk;M.M.J.W. van Herpen;D.J.W. Klunder;L. Bakker;H. Enkisch;S. Muellender;M. Richter;V. Banine;SPIE-The International Society for Optical Engineering
- 会议名称：《Conference on Emerging Lithographic Technologies》 | 2006年
- Mo/Si multilayers;
- EUV lithography;
- out of band radiation;
60.Multilayer optics with spectral purity layers for the EUV wavelength range

机译：具有频谱纯度层的多层光学器件，用于EUV波长范围
- 作者：E. Louis;R. W .E. van de Kruijs;A. E. Yakshin;S. Alonso van der Westen;F. Bijkerk;M. M. J. W. van Herpen;D. J. W. Klunder;L. Bakker;H. Enkisch;S. Mullender
- 会议名称：《Conference on Emerging Lithographic Technologies》 | 2006年
- Mo/Si multiayers;
- EUV Lithography;
- Out of band radiation;
61.Numerical modeling of absorber characteristics for EUVL

机译：EUVL吸收特性的数值模拟
- 作者：In-Yong Kang;Jinho Ahn;Hye-Keun Oh;Yong-Chae Chung
- 会议名称：《Conference on Emerging Lithographic Technologies》 | 2006年
- EUVL;
- absorber characteristic;
- pattern printability;
- reflectivity;
- aerial image image intensity;
62.Novel low thermal expansion material for EUV application

机译：用于EUV应用的新型低热膨胀材料
- 作者：Mitsuhiro Kawata;Akira Takada;Hideaki Hayashi;Naoki Sugimoto;Shinya Kikugawa
- 会议名称：《Conference on Emerging Lithographic Technologies》 | 2006年
- low thermal exansion;
- silica glass;
- structureal chemistry;
63.Novel low thermal expansion material for EUV application

机译：用于EUV应用的新型低热膨胀材料
- 作者：Mitsuhiro Kawata;Akira Takada;Hideaki Hayashi;Naoki Sugimoto;Shinya Kikugawa;SPIE-The International Society for Optical Engineering
- 会议名称：《Conference on Emerging Lithographic Technologies》 | 2006年
- low thermal expansion;
- silica glass;
- structural chemistry;
64.Numerical Modeling of Absorber Characteristics for EUVL

机译：EUVL吸收特性的数值模拟
- 作者：In-Yong Kang;Jinho Ahn;Hye-Keun Oh;Yong-Chae Chung;SPIE-The International Society for Optical Engineering
- 会议名称：《Conference on Emerging Lithographic Technologies》 | 2006年
- EUVL;
- absorber characteristics;
- pattern printability;
- reflectivity;
- aerial image intensity;
65.Imprint Technology: A Potential Low-Cost Solution for Sub-45 nm Device Applications

机译：压印技术：子45 NM设备应用的潜在低成本解决方案
- 作者：Ngoc V. Le;William J. Dauksher;Kathy A. Gehoski;Kevin J. Nordquist;Eric Ainley;Pawitter Mangat;SPIE-The International Society for Optical Engineering
- 会议名称：《Conference on Emerging Lithographic Technologies》 | 2006年
- step and flash imprint lithography;
- S-FIL;
- pattern transfer;
- residual layer;
66.Imprint technology: A potential low-cost solution for sub-45nm device applications

机译：压印技术：子45nm设备应用的潜在低成本解决方案
- 作者：Ngoc V. Le;William J. Dauksher;Kathy A. Gehoski;Kevin J. Nordquist;Eric Ainley;Pawitter Mangat
- 会议名称：《Conference on Emerging Lithographic Technologies》 | 2006年
- Step and Flash Imprint Lithography;
- S-FIL;
- pattern transfer;
- residual layer;
67.Lithographic Characterization of Low-Order Aberrations in a 0.3-NA EUV Microfield Exposure Tool

机译：0.3纳EUV微型曝光工具中低阶畸变的光刻表征
- 作者：Patrick Naulleau;Jason Cain;Kim Dean;Kenneth A. Goldberg;SPIE-The International Society for Optical Engineering
- 会议名称：《Conference on Emerging Lithographic Technologies》 | 2006年
- extreme ultraviolet;
- lithography;
- alignment;
- aberrations;
68.Advanced at-wavelength reflectometry with the EUV tube

机译：具有EUV管的先进的AT-波长反射测量
- 作者：Andre Egbert;Stefan Becker;SPIE-The International Society for Optical Engineering
- 会议名称：《Conference on Emerging Lithographic Technologies》 | 2006年
- microfocus EUV source;
- EUV metrology;
- EUV reflectometry;
- multilayer mirrors;
69.Lithographic characterization of low-order aberrations in a 0.3-NA EUV microfield exposure tool

机译：0.3纳EUV微型曝光工具中低阶畸变的光刻表征
- 作者：Patrick Naulleau;Jason Cain;Kim Dean;Kenneth A. Goldberg
- 会议名称：《Conference on Emerging Lithographic Technologies》 | 2006年
- extreme ultraviolet;
- lithography;
- alignment;
- aberrations;
70.Photocurable pillar arrays formed via AC- and ultrasound-induced electrohydrodynamic instabilities

机译：通过AC和超声波诱导的电液动力学稳定性形成的可光固化柱阵列
- 作者：avlos C. Tsiartas;Michael D. Dickey;Keris E. Allrich;C. G. Willson
- 会议名称：《Conference on Emerging Lithographic Technologies》 | 2006年
- Pillar arraye;
- alternative patterning;
- photocurable materials;
- electric field assisted self assembly;
71.EUV imaging with a 13nm tabletop laser reaches sub-38 nm spatial resolution

机译：带13nm桌面激光的EUV成像达到了Sub-38 NM空间分辨率
- 作者：Georgiy Vaschenko;Fernando Brizuela;Courtney Brewer;Miguel A. Larotonda;Yong Wang;Bradley M. Luther;Mario C. Marconi;Jorge J. Rocca;Carmen S. Menoni;Weilun Chao
- 会议名称：《Conference on Emerging Lithographic Technologies》 | 2006年
- Extreme ultraviolet imagingE;
- compact EUV lasers;
- EUV microscopy;
72.The Role of Stress in Nanoimprint Lithography

机译：压力在纳米压印光刻中的作用
- 作者：Hyun Wook Ro;Yifu Ding;Hae-Jeong Lee;Daniel R. Hines;Ronald L. Jones;Eric K. Lin;Alamgir Karim;Wen-li Wu;Christopher L. Soles;SPIE-The International Society for Optical Engineering
- 会议名称：《Conference on Emerging Lithographic Technologies》 | 2006年
- nanoimprint lithography;
- residual stress;
- thickness;
- pattern shape;
- metrology;
- X-ray reflectivity;
- critical dimension small angle scattering;
73.Phase defect observation using an EUV microscope

机译：使用EUV显微镜相位缺陷观察
- 作者：Kazuhiro Hamamoto;Yuzuru Tanaka;Takahiro Yoshizumi;Yasuyuki Fukushima;Hideaki Shiotani;Noriyuki Sakaya;Morio Hosoya;Tsutomu Shoki;Takeo Watanabe;Hiroo Kinoshita
- 会议名称：《Conference on Emerging Lithographic Technologies》 | 2006年
- EUV Lithography;
- EUV microscope;
- mask;
- defect;
74.Characterizing nanoimprint pattern cross-section and fidelity from x-ray reflectivity

机译：从X射线反射率表征纳米视图图案横截面和保真度
- 作者：Hae-Jeong Lee;Christopher L. Soles;Hyun W. Ro;D. R. Hines;Ronald L. Jones;Eric K. Lin;Alamgir Karim;Wen-li Wu
- 会议名称：《Conference on Emerging Lithographic Technologies》 | 2006年
- nanoimprint lithography;
- pattern fidelity;
- x-ray reflectivity;
- cross-sction;
- residual layer;
- pattern profele;
75.The EUV Resist Test Center at SEMATECH-North

机译：Sematech-North的EUV抵抗测试中心
- 作者：Klaus Lowack;Andy Rudack;Kim Dean;Matt Malloy;Mike Lercel;SPIE-The International Society for Optical Engineering
- 会议名称：《Conference on Emerging Lithographic Technologies》 | 2006年
- extreme ultraviolet;
- lithography;
- resist;
76.Photocurable Pillar Arrays Formed via AC- and Ultrasound-Induced Electrohydrodynamic Instabilities

机译：通过AC和超声波诱导的电液动力学稳定性形成的可光固化柱阵列
- 作者：Pavlos C. Tsiartas;Michael D. Dickey;Kens E. Allrich;C. Grant Willson;SPIE-The International Society for Optical Engineering
- 会议名称：《Conference on Emerging Lithographic Technologies》 | 2006年
- pillar arrays;
- alternative patterning;
- photocurable materials;
- electric field assisted self assembly;
77.The EUV resist test center at SEMATECH-North

机译：Sematech-North的EUV抵抗测试中心
- 作者：Klaus Lowack;Andy Rudack;Kim Dean;Matt Malloy;Mike Lercel
- 会议名称：《Conference on Emerging Lithographic Technologies》 | 2006年
- extreme ultraviolet;
- lithography;
- resist;
78.Phase Defect Observation Using an EUV Microscope

机译：使用EUV显微镜相位缺陷观察
- 作者：Kazuhiro Hamamoto;Yuzuru Tanaka;Takahiro Yoshizumi;Yasuyuki Fukushima;Hideaki Shiotani;Noriyuki Sakaya;Morio Hosoya;Tsutomu Shoki;Takeo Watanabe;Hiroo Kinoshita;SPIE-The International Society for Optical Engineering
- 会议名称：《Conference on Emerging Lithographic Technologies》 | 2006年
- EUV lithography;
- EUV microscope;
- mask;
- defect;
79.Micro/nano lithography realized by chemical printing

机译：通过化学印刷实现的微/纳米光刻
- 作者：Peng Yao;Garrett J. Schneider;Janusz Murakowski;Maciej Murakowski;Dennis W. Prather;SPIE-The International Society for Optical Engineering
- 会议名称：《Conference on Emerging Lithographic Technologies》 | 2006年
80.Characterizing Nanoimprint Pattern Cross-Section and Fidelity from X-ray Reflectivity

机译：从X射线反射率表征纳米视图图案横截面和保真度
- 作者：Hae-Jeong Lee;Christopher L. Soles;Hyun Wook Ro;D. R. Hines;Ronald L. Jones;Eric K. Lin;Alamgir Karim;Wen-li Wu;SPIE-The International Society for Optical Engineering
- 会议名称：《Conference on Emerging Lithographic Technologies》 | 2006年
- nanoimprint lithography;
- pattern fidelity;
- x-ray reflectivity;
- cross-section;
- residual layer;
- pattern profile;
81.The role of stress in nanoimprint lithography

机译：压力在纳米压印光刻中的作用
- 作者：Hyun W. Ro;Yifu Ding;Hae-Jeong Lee;Daniel R. Hines;Ronald L. Jones;Eric K. Lin;Alamgir Karim;Wen-li Wu;Christopher L. Soles
- 会议名称：《Conference on Emerging Lithographic Technologies》 | 2006年
- nanoimprint lithography;
- residual stree;
- thickness;
- pattern shape;
- metrology;
- X-ray reflectivity;
- critical dimension small angle scattering;
82.EUV imaging with a 13 nm tabletop laser reaches sub-38 nm spatial resolution

机译：用13nm桌面激光器的EUV成像达到了Sub-38 NM空间分辨率
- 作者：Georgiy Vaschenko;Fernando Brizuela;Courtney Brewer;Miguel A. Larotonda;Yong Wang;Bradley M. Luther;Mario C. Marconi;Jorge J. Rocca;Carmen S. Menoni;Weilun Chao;Erik H. Anderson;Yanwei Liu;David T. Attwood;SPIE-The International Society for Optical Engineering
- 会议名称：《Conference on Emerging Lithographic Technologies》 | 2006年
- extreme ultraviolet imaging;
- compact EUV lasers;
- EUV microscopy;
83.Advanced at-wavelength reflectometry with the EUV tube

机译：具有EUV管的先进的AT-波长反射测量
- 作者：Andre Egbert;Stefan Becker
- 会议名称：《Conference on Emerging Lithographic Technologies》 | 2006年
- microfocus EUV source;
- EUV metrology;
- EUV reflectomotry;
- multilayer mirrors;
84.Micro/nano lithography realized by chemical printing

机译：通过化学印刷实现的微/纳米光刻
- 作者：Peng Yao;Garrett J. Schneider;Janusz Murakowski;Maciej Murakowski;Dennis W. Prather
- 会议名称：《Conference on Emerging Lithographic Technologies》 | 2006年
85.A Character Projection Low Energy Electron Beam Direct Writing System for Device of Small Production Lot with a Variety of Design

机译：各种设计小型生产批量设备的特征投影低能电子束直接写入系统
- 作者：Fumihiko Nakamura;Katsuhide Watanabe;Hidetoshi Kinoshita;Hiroyuki Shinozaki;Yasushi Kojima;Satoshi Morita;Kouhei Noguchi;Norihiro Yamaguchi;Hisashi Isokawa;Kazuhiko Kushitani;Takayuki Satoh;Takeshi Koshiba;Takumi Oota;Tetsuro Nakasugi;SPIE-The International Society for Optical Engineering
- 会议名称：《Conference on Emerging Lithographic Technologies》 | 2006年
- low-energy EB;
- mask-less;
- EBDW;
- CP;
86.High Power Pulsed CO_2 Laser for EUV Lithography

机译：用于EUV光刻的高功率脉冲CO_2激光器
- 作者：Tatsuya Ariga;Hideo Hoshino;Taisuke Miura;Akira Endo;SPIE-The International Society for Optical Engineering
- 会议名称：《Conference on Emerging Lithographic Technologies》 | 2006年
- EUV;
- laser produced plasma;
- CO_2 laser;
- axial flow;
87.EUV Generation from Lithium Laser Plasma for Lithography

机译：从锂激光等离子体的EUV生成光刻
- 作者：Simi A. George;William Silfvast;Kazutoshi Takenoshita;Robert Bernath;Chiew-Seng Koay;Greg Shimkaveg;Martin Richardson;Moza Al-Rabban;Howard Scott;SPIE-The International Society for Optical Engineering
- 会议名称：《Conference on Emerging Lithographic Technologies》 | 2006年
- laser plasmas;
- EUV lithography;
- lithium;
- tin;
- EUV sources;
- EUV spectroscopy;
88.Characterization of striae in ULE for EUVL optics and masks

机译：EUVL光学和面具中宽松级的特征
- 作者：William Rosch;Lorrie Beall;John Maxon;Robert Sabia;Robert Sell
- 会议名称：《Conference on Emerging Lithographic Technologies》 | 2006年
- ULE;
- EUVL;
- photomasks;
- striae;
- spatial frequency rouhness;
- retardation;
- frequency;
- birefringence;
- titania;
89.Aerial-image modeling for the extreme ultraviolet microfield exposure tool at SEMATECH North

机译：Sematech North最紫外线微型曝光工具的空中图像建模
- 作者：Patrick Naulleau;Kim Dean;Klaus Lowack
- 会议名称：《Conference on Emerging Lithographic Technologies》 | 2006年
- extreme ultraviolet;
- lithography;
- modeling;
- aerial image;
- resist;
90.High-Sensitivity Interferometric Schemes for ML2 Micromirror Calibrations

机译：ML2微镜校准的高灵敏度干涉方案
- 作者：Jen-Shiang Wang;Olav Solgaard;Andrew R. Neureuther;SPIE-The International Society for Optical Engineering
- 会议名称：《Conference on Emerging Lithographic Technologies》 | 2006年
- maskless lithography;
- SLM;
- calibration;
- micromirror;
- ML2;
91.Visible light point-diffraction interferometer for testing of EUVL optics

机译：用于测试EUVL光学的可见光点衍射干涉仪
- 作者：Seiji Takeuchi;Osamu Kakuchi;Kenji Yamazoe;Yoshio Gomei;Todd A. Decker;Michael A. Johnson;Donald W. Phillion;John S. Taylor
- 会议名称：《Conference on Emerging Lithographic Technologies》 | 2006年
- Interfermeter;
- PDI;
- EUV;
- lithography;
- wavefront;
92.High-precision ( < 1ppb/°C) Optical Heterodyne Interferometric Dilatometer for Determining Absolute CTE of EUVL Materials

机译：高精度（<1ppb /°C）光学杂差干涉膨胀计，用于确定EUVL材料的绝对CTE
- 作者：Yoshimasa Takeichi;Iwao Nishiyama;Naofumi Yamada;SPIE-The International Society for Optical Engineering
- 会议名称：《Conference on Emerging Lithographic Technologies》 | 2006年
- LTEM;
- EUVL;
- CTE;
- optical heterodyne interferometer;
- optics;
- mask substrate;
93.High-precision (<1ppb/°C) optical heterodyne interferometric dilatometer for determining absolute CTE of EUVL materials

机译：高精度（<1ppb /°C）光学杂差干涉膨胀计，用于确定EUVL材料的绝对CTE
- 作者：Yoshimasa Takeichi;Iwao Nishiyama;Naofumi Yamada
- 会议名称：《Conference on Emerging Lithographic Technologies》 | 2006年
- LTEM;
- EUVL;
- CTE;
- optical heterodyne interferometer;
- optics;
- mask substrate;
94.Demonstration of phase-shift masks for extreme-ultraviolet lithography

机译：极端紫外线光刻相移掩模的演示
- 作者：Bruno La Fontaine;Adam R. Pawloski;Obert Wood;Yunfei Deng;Harry J. Levinson;Patrick Naulleau;Paul E. Denham;Eric Gullikson;Brian Hoef;Christian Holfeld
- 会议名称：《Conference on Emerging Lithographic Technologies》 | 2006年
- EUV lithography;
- phase-shift masks;
- actinic characterization;
95.Aerial-image modeling for the extreme ultraviolet microfield exposure tool at SEMATECH North

机译：Sematech North最紫外线微型曝光工具的空中图像建模
- 作者：Patrick Naulleau;Kim Dean;Klaus Lowack;SPIE-The International Society for Optical Engineering
- 会议名称：《Conference on Emerging Lithographic Technologies》 | 2006年
- extreme ultraviolet;
- lithography;
- modeling;
- aerial image;
- resist;
96.EUV optical system for the Reticle Imaging Microscope (RIM)

机译：EUV光学系统，用于掩模版成像显微镜（边缘）
- 作者：H. Glatzel;J. Daniel;K. Khajehnouri;U. Mueller;T. Roff;J. Rosenbohm;S. Sporer;SPIE-The International Society for Optical Engineering
- 会议名称：《Conference on Emerging Lithographic Technologies》 | 2006年
- aspheres;
- optical metrology;
- high-reflectivity coatings;
- reflectometry;
- surface topology;
- polishing;
- EUV;
- transmitted wavefront error;
97.Characterization of striae in ULE~reg; for EUVL optics and masks

机译：EUVL光学和面具的ULE〜®中Striae的特征
- 作者：William Rosch;Lorrie Beall;John Maxon;Robert Sabia;Robert Sell;SPIE-The International Society for Optical Engineering
- 会议名称：《Conference on Emerging Lithographic Technologies》 | 2006年
- ULE;
- EUVL;
- photomasks;
- striae;
- spatial frequency roughness;
- retardation;
- frequency;
- birefringence;
- titania;
98.High-power pulsed CO2 laser for EUV lithography

机译：用于EUV光刻的高功率脉冲CO2激光器
- 作者：Tatsuya Ariga;Hideo Hoshino;Taisuke Miura;Taisuke Miura
- 会议名称：《Conference on Emerging Lithographic Technologies》 | 2006年
- EUV;
- Laser Produced Plasma;
- CO_2 Laser;
- axial flow;
99.Data conversion system for character projection-type low-energy electron beam direct writing system

机译：用于字符投影型低能量电子束直接写入系统的数据转换系统
- 作者：Ryoichi Inanami;Katsumi Kishimoto;Kazuhiro Nakai;Yoshikazu Ichioka;Kiyoshi Kitamura;Ryo Yamada;Shunko Magoshi
- 会议名称：《Conference on Emerging Lithographic Technologies》 | 2006年
- EBDW;
- EBIS;
- Character Projection;
- mask-less lithography;
- data conversion;
100.EUV generation from lithium laser plasma for lithography

机译：从锂激光等离子体的EUV生成光刻
- 作者：Simi A. George;William Silfvast;Kazutoshi Takenoshita;Robert Bernath;Chiew-Seng Koay;Greg Shimkaveg;Martin Richardson;Moza Al-Rabban;Howard Scott
- 会议名称：《Conference on Emerging Lithographic Technologies》 | 2006年
- LASER PLASMAS;
- MUV Lithography;
- Lithium;
- Tin;
- EUV source;
- EUV spectrocopy;