首页> 外文会议>Electronics Manufacturing Technology Symposium, 1999. Twenty-Fourth IEEE/CPMT >Post-processing of conductive lithographic films for multilayer device fabrication
【24h】

Post-processing of conductive lithographic films for multilayer device fabrication

机译:用于多层器件制造的导电光刻膜的后处理

获取原文

摘要

Cheap, flexible conductive interconnects have the potential for application to a wide variety of device structures. Conductive lithography is a very fast single-stage printing process for flexible electrical interconnects. For the more challenging exploitation areas in multilayer devices, such as displays, it was found that the existing films could not be employed in their current form and three parameters were identified as critical to device fabrication. Two distinct methods of post-processing have been investigated, calendering and electroless plating, to improve properties. Both methods aimed to modify the surface roughness and conductivity, with the plating study also modifying the work function. We report the successful evaluation of polymer light-emitting diodes fabricated using these electrode structures and compare their properties. It is expected that these developments will stimulate further progress in multilayer device fabrication.
机译:廉价的灵活导电互连有可能应用于各种设备结构。导电光刻是一种非常快速的单级印刷过程,用于柔性电互连。对于多层器件中的更具挑战性的开发区域,例如显示器,发现现有的薄膜不能以其当前形式使用,并且将三个参数鉴定为对装置制造至关重要。已经研究了两种不同的后处理方法,压延和化学镀,以改善性质。两种方法旨在改变表面粗糙度和电导率,电镀研究还修改了工作功能。我们报告了使用这些电极结构制造的聚合物发光二极管的成功评估,并比较它们的性质。预计这些发展将刺激多层器件制造的进一步进展。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号