Advanced Chemically Amplified Resist Resist Process Using Non-Ammonia Generating Adhesion Promoter

摘要

We have developed a new non-ammonia generating adhesion promoter, 4-trimethy lsiloxy-3-pentene-2-one. Its adhesion capability for a substrate is superior to a conventional adhesion promoter, hexamethy ldisilazane, owing to its high reactivity. We obtained high aspect ratio and precise chemically amplified resist patterns on Si and TiN substrates usign this new adhesion promoter.