首页> 外文会议>Indium Phosphide and Related Materials, 1995. Conference Proceedings., Seventh International Conference on >High-mobility Ga/sub 0.47/In/sub 0.53/As/InP heterostructure by atmospheric-pressure MOVPE using cyclopentadienyl indium
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High-mobility Ga/sub 0.47/In/sub 0.53/As/InP heterostructure by atmospheric-pressure MOVPE using cyclopentadienyl indium

机译:大气压MOVPE使用环戊二烯基铟进行高迁移率Ga / sub 0.47 / In / sub 0.53 / As / InP异质结构

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Lattice matched Ga/sub 0.47/In/sub 0.53/As/InP heterostructure was grown by an atmospheric-pressure MOVPE reaction system using monovalent cyclopentadienyl indium (C/sub 5/H/sub 5/In). The heterointerface characteristics were evaluated using double crystal X-ray diffraction method and wedge TEM technique. The reaction system gave /spl Delta/a/a=2.95/spl times/10/sup -4/ accompanied by a smooth mirror-like surface. The abrupt Ga/sub 0.47/In/sub 0.53/As/InP heterointerface was also given. The lattice matched heterostructure showed electron mobilities of /spl mu//sub 300 K/==12 700 cm/sup 2//Vs at n/sub s,300/ /sub K/=4.2/spl times/10/sup 11/ cm/sup -2/ and /spl mu//sub 77 K/=108 000 cm/sup 2//Vs at n/sub 2,77 K/=3.9/spl times/10/sup 11/ cm/sup -2/.
机译:通过使用单价环戊二烯基铟(C / sub 5 / H / sub 5 / In)的大气压MOVPE反应系统生长晶格匹配的Ga / sub 0.47 / In / sub 0.53 / As / InP异质结构。使用双晶X射线衍射法和楔形TEM技术评价异质界面特性。反应系统给出的/ spl Delta / a / a = 2.95 / spl乘以10 / sup -4 /伴随着光滑的镜面状表面。还给出了突然的Ga / sub 0.47 / In / sub 0.53 / As / InP异质界面。晶格匹配的异质结构在n / sub s时电子迁移率为/ spl mu // sub 300 K / == 12 700 cm / sup 2 // Vs,300 / / sub K / = 4.2 / spl次/ 10 / sup / cm / sup -2 /和/ spl mu // sub 77 K / = 108 000 cm / sup 2 // vs在n / sub 2,77 K / = 3.9 / spl次/ 10 / sup 11 / cm / sup -2 /。

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