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Target Setting with Consideration of Target-induced Operation Variability for Performance Improvement of Semiconductor Fabrication

机译:考虑到目标诱导的操作变化的目标设置,以实现半导体制造的性能改善

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Production target setting is common in practice to guide operations such as machine allocation and lot dispatching to achieve master production schedule (MPS). As targets affect operations and hence wafer flows, wafer flow estimation under given daily production targets is a basis of adjusting targets and machine allocation. This paper presents an innovative design of target setting algorithm (TaSIV) that develops the target-tracking service model by characterizing target-induced mean and variability and designs a hybrid flow time approximation by exploiting transient tendon queue analysis between two stages to set targets for improving production performance. The design first adopts a Bernoulli trial with proportional-to-target probability to model the target-tracking machine allocation and FIFO dispatching and then characterize the target-induced variability (TIV). To capture the effect of TIV on wafer flows, the design then approximates the time for the last wafer in initial WIP of a stage to finish processing at the next stage, named two-stage penetration time approximation, APT-2, by using Markov chain analysis of tandem queues with given initial number of wafers. By Integrating APT-2 into a recursive algorithm, SOPEA, the design estimates penetration time of multiple stages and wafer flows in a fab. Finally, our design integrates APT-2/SOPEA into a fixed-point iteration between wafer flow estimation and capacity allocation for target setting with consideration of TIV. Over a mini-Fab example and given targets generated by TaSIV, simulation of proportional-to-target machine allocation and FIFO dispatching demonstrates that targets generated by TaSIV reduces over-optimism and close to actual moves by 30.7% of bottleneck machine groups as compared to a mean-value based scheme frequently adopted by practitioners of fab operation management. TaSIV also leads to reductions of 1.2% in mean cycle time and 15.4% in cycle time variance at 1.1% throughput increase.
机译:生产目标设定是在实践中引导操作的通用诸如计算机分配和调度很多实现主生产计划(MPS)。作为靶影响操作,因而晶片流动,晶片下给出每日生产目标流量估计是调整目标和计算机分配的基础。本文呈现目标设定算法的一个创新设计(TaSIV),其通过表征目标诱导的平均和可变性的发展目标跟踪服务模型,并通过两个级之间利用瞬态肌腱队列分析,以设定的目标为改善设计的混合流动时间近似生产性能。设计第一采用伯努利试验采用比例 - 目标概率建模的目标跟踪机分配和调度FIFO,然后表征目标诱导的变异性(TIV)。为了捕捉TIV的效果上晶片流动,该设计然后近似为在下一阶段的阶段到完成处理的初始WIP最后晶片,命名为双级渗透时间近似时,APT-2,通过使用马尔可夫链与晶片的给定的初始数目串联队列分析。由2 APT-集成到一个递归算法,SOPEA,设计估计多个阶段的渗透时间和晶片在晶圆厂中流动。最后,我们的设计集成APT-2 / SOPEA到晶片流估计和容量分配之间的固定点迭代考虑TIV的目标设定。在由TaSIV,比例到目标计算机分配和FIFO调度的仿真生成一个小型的Fab示例和给定目标演示通过TaSIV产生的目标与通过瓶颈计算机组的30.7%减少过分乐观和接近实际移动基于均值方案由工厂运营管理的从业者经常采用。 TaSIV也导致在1.1%的吞吐量增长的平均周期时间的1.2%减少和15.4%的周期的时间差异。

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