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Graphene electro-absorption modulators integrated at wafer-scale in a CMOS fab

机译:石墨烯电吸收调制器集成在CMOS Fab中的晶片级

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We demonstrate graphene electro-absorption modulators (EAM) integrated on 300mm wafers. The integration is based on imec’s 300mm silicon photonics platform and the full integration sequence is using standard CMOS production tools expect for the 6-inch CVD graphene growth and transfer, transferred by Graphenea. 164x TE EAMs were measured per wafer and demonstrate 90% yield with modulation efficiency (ME) of 41±5.6 dB/mm for 8V voltage swing, after process optimization. The 3dB bandwidth of the EAMs is 14.9±1.2 GHz for the device with 50µm active length. Both parameters show comparable performance with lab-based devices, obtained on coupons using similar CVD graphene. This work paves the way to enable high-volume manufacturing of 2D-material-based photonics devices.
机译:我们展示了集成在300mm晶圆上的石墨烯电吸收调制器(EAM)。 整合基于IMEC的300mm硅光子电容平台,并且完整的集成序列正在使用标准CMOS生产工具,期望由Graphenea转移的6英寸CVD石墨烯生长和转移。 每晶片测量164X TE EAM,并在工艺优化后,通过调制效率(ME)为41±5.6dB / mm的调制效率(ME),为8V±5.6db / mm的90%。 对于具有50μm的器件,EAMS的3DB带宽为50μm,有效长度为50μm。 两个参数都显示了使用类似CVD石墨烯的优惠券的基于实验室的设备的相当性能。 这项工作铺平了能够实现基于2D材料的光元件设备的大批量生产的方式。

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