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Optimisation of integrated RF varactors on a 0.35 /spl mu/m BiCMOS technology

机译:在0.35 / spl mu / m BiCMOS技术上优化集成射频变容二极管

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Integrated varactors are becoming a common feature for many RF designs and in particular RF voltage controlled oscillators (VCOs). Optimisation of the quality of both the inductor and the varactor from the VCO core is essential. This work details the characterisation and optimisation of a number of varactor types available on a typical sub-micron BiCMOS process. Engineering of the bottom plate of the varactor was used to optimise the quality factor of the varactor. No additional mask layers or processing steps were required to achieve this. Integrated isolated diode varactors with quality factors of 30 at 2 GHz have been demonstrated with tuning capacitance ranges of 2.5. Integrated MOS capacitor varactors with quality factors of 50 at 2 GHz have been demonstrated with tuning capacitance range of 5.
机译:集成变容二极管正在成为许多RF设计(尤其是RF压控振荡器(VCO))的常见功能。从VCO磁芯优化电感器和变容二极管的质量至关重要。这项工作详细介绍了典型亚微米BiCMOS工艺上可用的多种变容二极管类型的表征和优化。变容二极管底板的工程设计用于优化变容二极管的品质因数。无需额外的掩模层或加工步骤即可实现这一目标。集成隔离二极管变容二极管在2 GHz时的品质因数为30,其调谐电容范围为2.5。集成MOS电容变容二极管在2 GHz时具有50的品质因数,其调谐电容范围为5。

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