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Room temperature CW Operation of a GaInAs/GaInAsP/InP SCH Laser with Quantum-Wire Size Active Region

机译:具有量子线尺寸有源区的GaInAs / GaInAsP / InP SCH激光器的室温CW操作

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摘要

A room temperature CW operation of a GaInAs/GaInAsP/InP SCH quantum-wire laser with 5nm thick and 10-30nm wide vertically stacked triple-wire active region was achieved by using 2-step LP-OMVPE growth on p-type InP substrate, to increase the hole injection efficiency, and direct writing by an electron beam exposure followed by wet chemical etching.
机译:通过在p型InP衬底上进行两步LP-OMVPE生长,实现了具有5nm厚和10-30nm宽垂直堆叠三线有源区的GaInAs / GaInAsP / InP SCH量子线激光器的室温CW操作,以提高空穴注入效率,并通过电子束曝光直接写入,然后进行湿法化学蚀刻。

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