首页> 外文会议>International Conference on Nitride Semiconductors(ICNS-5); 20030525-20030530; Nara; JP >Development of a 2'-AlGaN/GaN HEMT technology on sapphire and SiC for mm-wave high-voltage power applications
【24h】

Development of a 2'-AlGaN/GaN HEMT technology on sapphire and SiC for mm-wave high-voltage power applications

机译:在蓝宝石和SiC上开发用于毫米波高压功率应用的2“ -AlGaN / GaN HEMT技术

获取原文
获取原文并翻译 | 示例

摘要

The suitability of AlGaN/GaN HEMTs on SiC is discussed with respect to mm-wave applications at 40 GHz and beyond. A 0.15 μm T-gate AlGaN/GaN-HEMT 2-inch technology on SiC and sapphire was developed for high power applications and for frequencies beyond 30 GHz. Large periphery devices with 0.48 mm gate width show a cw output power of 0.86 W at 40 GHz. AlGaN/GaN dual-gate HEMTs show MSG/MAG of > 13 dB at 60 GHz with 0.15 μm gate length.
机译:针对40 GHz及更高​​频率下的毫米波应用,讨论了SiC上AlGaN / GaN HEMT的适用性。在SiC和蓝宝石上开发了0.15μmT栅极AlGaN / GaN-HEMT 2英寸技术,用于高功率应用和30 GHz以上的频率。栅极宽度为0.48 mm的大型外围设备在40 GHz下的cw输出功率为0.86W。 AlGaN / GaN双栅极HEMT在60 GHz时具有0.15μm的栅极长度,MSG / MAG大于13 dB。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号