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100 V class multiple stepped oxide field plate trench MOSFET (MSO-FP-MOSFET) aimed to ultimate structure realization

机译:旨在实现最终结构的100 V类多级氧化物场板沟槽MOSFET(MSO-FP-MOSFET)

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For low-voltage power MOSFETs technology, Field Plate (FP) and Superjunction (SJ) structures have been applied to reduce on-resistance drastically. As one of the approach for the ultimate structure realization, we propose a multiple stepped oxide FP-MOSFET (MSO-FP-MOSFET) that is extremely close to ideal gradient oxide structure. We have validated an optimum device structure by TCAD simulation and achieved lowest on-resistance of 28.5 mΩmm at breakdown voltage of 115.2 V. This performance indicates 25 % improvement compared to conventional devices. Moreover, to demonstrate the MSO-FP-MOSFET characteristics for the first time, we present some measurement data of TEG samples.
机译:对于低压功率MOSFET技术,已应用场板(FP)和超结(SJ)结构来大幅度降低导通电阻。作为实现最终结构的一种方法,我们提出了一种非常接近理想梯度氧化物结构的多步氧化物FP-MOSFET(MSO-FP-MOSFET)。我们已经通过TCAD仿真验证了一种最佳的器件结构,并且在115.2 V的击穿电压下实现了最低的28.5mΩmm导通电阻。与常规器件相比,该性能表明提高了25%。此外,为了首次展示MSO-FP-MOSFET的特性,我们提供了一些TEG样品的测量数据。

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