Corporate Research Development Center, Toshiba Corporation, 1, Komukai-Toshiba-cho, Saiwai-ku, Kawasaki 212-8582, Japan;
Corporate Research Development Center, Toshiba Corporation, 1, Komukai-Toshiba-cho, Saiwai-ku, Kawasaki 212-8582, Japan;
Corporate Research Development Center, Toshiba Corporation, 1, Komukai-Toshiba-cho, Saiwai-ku, Kawasaki 212-8582, Japan;
Corporate Research Development Center, Toshiba Corporation, 1, Komukai-Toshiba-cho, Saiwai-ku, Kawasaki 212-8582, Japan;
Corporate Research Development Center, Toshiba Corporation, 1, Komukai-Toshiba-cho, Saiwai-ku, Kawasaki 212-8582, Japan;
Corporate Research Development Center, Toshiba Corporation, 1, Komukai-Toshiba-cho, Saiwai-ku, Kawasaki 212-8582, Japan;
LEDs; GaN; Si substrate; threading dislocation; multi-quantum wells; AlGaN interlayers; external quantum efficiency; hot/cold factor; transmission electron microscopy; three-dimensional atom probe;
机译:通过插入薄的AlGaN中间层,在Si衬底上生长的InGaN / GaN多量子阱增强蓝色发光二极管的性能
机译:在蓝宝石(0001)衬底上采用InGaN / GaN MQW结构中的AlGaN中间层的绿色LED的增强的光输出功率
机译:(1-101)InGaN / GaN和GaN / AlGaN MQW结构在偏心轴(001)Si衬底上生长的光谱
机译:高效的蓝色LED,in Ingan / GaN MQWS中的薄AlGaN中间层在Si(111)基板上生长
机译:用于AlGaN / GaN和InAlN / GaN二极管以及在硅(111)衬底上生长的高迁移率晶体管的CMOS兼容氧化钌肖特基接触的研究。
机译:GaOOH NRA使用薄的ATO种子层改善了InGaN / GaN蓝色LED的光提取
机译:高级缓冲层对(111)硅衬底上生长的InGaN / GaN mQW光学性质的影响
机译:经受高电流脉冲的蓝色alGaN / InGaN / GaN LED的劣化