Simulation of resolution enhancement in contact lithography by off-axis illumination

机译：离轴照明模拟提高接触光刻的分辨率

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Intensity distribution on the wafer plane in contact printing system under off-axis illumination is derived based on the amplitude analytic expression for Fresnel-Kirchhoff diffraction. Numerical simulations have been done under various conditions. Resolution enhancement effects by off-axis illumination and its application are analyzed.

机译：基于菲涅耳-基尔霍夫衍射的幅值解析表达式，得出了轴外照射下接触印刷系统中晶片平面上的强度分布。在各种条件下都进行了数值模拟。分析了离轴照明的分辨率增强效果及其应用。

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来源
《Conference on Microlithographic Techniques in Integrated Circuit Fabrication II, Nov 28-30, 2000, Singapore》|2000年|p.139-142|共4页
会议地点 Singapore(SG)
作者
Yongkai Zhao; Huijie Huang; Dunwu Lu; Longlong Du; Cailai Yuan; Baocai Jiang; Runwen Wang;
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作者单位

Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences PO Box 800-216, Shanghai 201800, China;

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会议组织
原文格式 PDF
正文语种 eng
中图分类无线电电子学、电信技术;
关键词
excimer laser lithography contact lithography resolution enhancement; off-axis illumination;

机译：准分子激光光刻接触光刻分辨率提高；离轴照明;

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机译：通过高数值孔径的离轴照明改善非接触等离子透镜的成像对比度
2. Method of pupil shaping for off-axis illumination in optical lithography [J] . Chen Ming, Zhang Fang, Zeng Aijun, Journal of optical technology . 2016,第3期

机译：光刻中用于轴外照明的光瞳整形方法
3. A METHOD OF PUPIL SHAPING FOR OFF-AXIS ILLUMINATION IN OPTICAL LITHOGRAPHY [J] . Ming Chen, Fang Zhang, Aijun Zeng, Оптический журнал . 2016,第3期

机译：光学光刻中轴成形的瞳孔整形方法
4. Simulation of resolution enhancement in contact lithography by off-axis illumination [C] . Yongkai Zhao, Huijie Huang, Dunwu Lu, Conference on microlithographic techniques in integrated circuit fabrication . 2000

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8. Maskless Lithography Using Surface Plasmon Enhanced Illumination [R] . Larson, D. 2007

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Simulation of resolution enhancement in contact lithography by off-axis illumination

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