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Lithography patterning with sub-resolution assistant patterns and off-axis illumination
Lithography patterning with sub-resolution assistant patterns and off-axis illumination
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机译:具有亚分辨率辅助图案和离轴照明的光刻图案
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摘要
A photolithography system includes a substrate stage for holding a workpiece, and a mask having main patterns and sub-resolution assistant patterns. The system further includes a diffractive optical element (DOE) for directing a radiation having an aerial image of the main patterns onto the workpiece. The DOE includes a first pair of poles that is positioned symmetrically about a center of the DOE along a first direction. The main patterns are oriented lengthwise along a second direction that is perpendicular to the first direction. The sub-resolution assistant patterns are oriented lengthwise along the first direction.
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