Semiconductor Materials Research Department, Materials Research laboratories, Nissan Chemical Industries, Ltd. 635 Sasakura, Fuchu-machi, Toyama 939-2792 Japan;
Semiconductor Materials Research Department, Materials Research laboratories, Nissan Chemical Industries, Ltd. 635 Sasakura, Fuchu-machi, Toyama 939-2792 Japan;
Semiconductor Materials Research Department, Materials Research laboratories, Nissan Chemical Industries, Ltd. 635 Sasakura, Fuchu-machi, Toyama 939-2792 Japan;
Pattern collapse; Dry Development Rinse process(DDR process); Dry Development Rinse material (DDR material);
机译:EUVL的干法冲洗过程(DDRP)和材料(DDRM)
机译:EUVL的干法冲洗过程(DDRP)和材料(DDRM)
机译:干法冲洗工艺扩展ArFi的新方法
机译:干燥开发冲洗(DDR)工艺和用于ARF / EUV延长技术的材料,朝向1xNM HP及更远
机译:原位电化学残留传感器和过程模型在纳米结构的漂洗和干燥中的应用。
机译:新型干姜黄粉(Curcuma Longa L.)的高功率-短时间(HPST)微波辅助商业去污工艺的开发
机译:ARF浸没抗蚀剂延长的材料开发
机译:核废燃料干粉加工中的材料衡量技术