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SEM and ECC imaging study of step-bunched structure on 4H-SiC epitaxial layers

机译:4H-SiC外延层上阶梯状结构的SEM和ECC成像研究

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摘要

Summary form only given. The complete presentation was not made available for publication as part of the conference proceedings. Step bunching on a vicinal 4H-SiC (0001) epitaxial layer surface was investigated using low-voltage scanning electron microscopy (LVSEM) and low-energy electron channeling contrast (ECC) imaging. LVSEM observations revealed that the step bunching resulted in the formation of atomically flat wide (∼250 nm) terraces on the surface, and the terraces tended to form in pairs. The two terraces in paired terraces often showed the same electron channeling contrast as each other, and the contrast of the two terraces, either bright or dark, appeared to be determined by the orthogonal misorientation of substrates. On the basis of these results, the formation mechanism of the step-bunched structure on a vicinal 4H-SiC (0001) surface is discussed.
机译:仅提供摘要表格。完整的演示文稿未作为会议记录的一部分公开发布。使用低压扫描电子显微镜(LVSEM)和低能电子通道对比度(ECC)成像研究了在临近的4H-SiC(0001)外延层表面上的成束现象。 LVSEM观察表明,台阶聚束导致在表面上形成原子平坦的宽(约250 nm)台阶,并且台阶倾向于成对形成。成对的梯田中的两个梯田经常显示彼此相同的电子通道对比度,并且两个梯田的对比度(亮或暗)似乎由基板的正交取向错误决定。基于这些结果,讨论了在邻近的​​4H-SiC(0001)表面上的台阶状结构的形成机理。

著录项

  • 来源
  • 会议地点 Halkidiki(GR)
  • 作者单位

    Kwansei Gakuin University, School of Science and Technology, 2-1 Gakuen, Sanda, Hyogo 669-1337, Japan;

    Kwansei Gakuin University, School of Science and Technology, 2-1 Gakuen, Sanda, Hyogo 669-1337, Japan;

    Kwansei Gakuin University, School of Science and Technology, 2-1 Gakuen, Sanda, Hyogo 669-1337, Japan;

    Kwansei Gakuin University, School of Science and Technology, 2-1 Gakuen, Sanda, Hyogo 669-1337, Japan;

    Kwansei Gakuin University, School of Science and Technology, 2-1 Gakuen, Sanda, Hyogo 669-1337, Japan;

    Nippon Steel Sumitomo Metal Corporation, Advanced Technology Research Laboratories, 20-1 Shintomi, Futtsu, Chiba 293-8511, Japan;

    Nippon Steel Sumitomo Metal Corporation, Advanced Technology Research Laboratories, 20-1 Shintomi, Futtsu, Chiba 293-8511, Japan;

    Nippon Steel Sumitomo Metal Corporation, Advanced Technology Research Laboratories, 20-1 Shintomi, Futtsu, Chiba 293-8511, Japan;

    Nippon Steel Sumitomo Metal Corporation, Advanced Technology Research Laboratories, 20-1 Shintomi, Futtsu, Chiba 293-8511, Japan;

  • 会议组织
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    Surface morphology; Epitaxial layers; Silicon carbide; Scanning electron microscopy; Substrates;

    机译:表面形貌;外延层;碳化硅;扫描电镜;基底;

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