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Substrate bias effects on noise and minority carrier lifetime in SOI MOSFET single-photon detector

机译:衬底偏置对SOI MOSFET单光子检测器中的噪声和少数载流子寿命的影响

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Operation speed of the single-photon detector based on the silicon-on-insulator (SOI) metal-oxide-semiconductor field-effect transistor (MOSFET) is affected by the noise and minority carrier lifetime, both of which are found to be dependent on the substrate bias. The noise spectrum are obtained at various substrate voltages in dark condition while keeping the average drain current constant. The noise becomes minimum at around the transition point between front- and back-channel operations, and in the back-channel region near the transition point. On both negative and positive sides of the substrate voltage, the noise shows peculiar Lorentzian spectra. Minority carrier lifetime is evaluated by the analysis of drain current histogram at different substrate voltages. It is found that the peaks in the histogram corresponding to the larger number of stored holes become higher as the substrate bias becomes more positive. This can be attributed to the prolonged lifetime presumably caused by the higher electric field inside the body of SOI MOSFET. It can be concluded that, once the inversion channel is induced for detection of the photo-generated minority carriers, the small absolute substrate bias is favorable for short lifetime and low noise, leading to high-speed operation.
机译:基于绝缘体上硅(SOI)金属氧化物半导体场效应晶体管(MOSFET)的单光子检测器的运行速度受噪声和少数载流子寿命的影响,这两者均取决于基板偏置。在黑暗条件下,在各种衬底电压下获得噪声频谱,同时保持平均漏极电流恒定。在前,后通道操作之间的过渡点附近以及过渡点附近的后通道区域中,噪声变得最小。在基板电压的正负两面,噪声都显示出奇特的洛伦兹光谱。通过分析不同衬底电压下的漏极电流直方图,可以评估少数载流子的寿命。已经发现,随着衬底偏压变得更正,与更大数量的存储的空穴相对应的直方图中的峰变得更高。这可能归因于SOI MOSFET体内较高的电场,从而延长了使用寿命。可以得出的结论是,一旦感应出反向沟道以检测光生少数载流子,则小的绝对衬底偏置将有利于短寿命和低噪声,从而实现高速运行。

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