METHOD FOR FORMING CONFORMAL CARBON FILMS STRUCTURES AND DEVICES INCLUDING A CONFORMAL CARBON FILM AND SYSTEM OF FORMING SAME

摘要

A method of forming carbon films, structures and devices including carbon films, and systems for forming carbon films are disclosed. The method includes depositing a metal carbide film using atomic layer deposition (ALD). The metal is removed from the metal carbide film to form a carbon film from the metal carbide film. Since the films are formed using ALD, the films can have a relatively conformal and relatively uniform thickness to the surface of the substrate.