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FLEET MATCHING OF SEMICONDUCTOR METROLOGY TOOLS WITHOUT DEDICATED QUALITY CONTROL WAFERS
FLEET MATCHING OF SEMICONDUCTOR METROLOGY TOOLS WITHOUT DEDICATED QUALITY CONTROL WAFERS
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机译:没有专用质量控制晶片的半导体计量工具的舰队匹配
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摘要
Methods and systems for calibrating metrology tool offset values to match measurement results across a fleet of metrology tools are presented herein. The calibration of offset values is based on measurements of inline, production wafers and does not require the use of specially fabricated and characterized quality control (QC) wafers. In this manner, the entire process flow to calibrate metrology tool offset values is automated and fully integrated within a high volume semiconductor fabrication process flow. In a further aspect, the implementation of a new offset value is regulated by one or more predetermined control limit values. In another further aspect, the measured values of a parameter of interest are adjusted to compensate for the effects of measurement time on the wafer under measurement.
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