MULTIELECTRON BEAM INSPECTION DEVICE AND MULTIELECTRON BEAM INSPECTION METHOD

摘要

A multielectron beam inspection device (100) of an embodiment of the present invention is characterized by being provided with: a secondary-electron image acquisition mechanism (150) for irradiating a sample (101) having a pattern formed thereon with a multi-primary-electron beam (20), detecting a multi-secondary-electron beam (300) emitted due to the irradiation of the sample with the multi-primary-electron beam, and acquiring a secondary-electron image containing a crosstalk component; a correction circuit (132) for generating a corrected secondary-electron image obtained by removing the crosstalk component from the secondary-electron image by using preset gain information with which to remove the crosstalk component from the secondary-electron image; and a comparison circuit (108) for comparing the corrected secondary-electron image with a predetermined image (123).