Thin-film deposition equipment, thin-film deposition method, and method for manufacturing orthorhombic thin-film deposition film

摘要

PROBLEM TO BE SOLVED: To provide a vapor deposition apparatus, a vapor deposition method and a method for producing an oblique vapor deposition film capable of reducing in-plane variations in optical characteristics as compared with the conventional ones. SOLUTION: This is a thin-film deposition apparatus for forming a thin-film deposition film on a substrate, with a rotation mechanism for rotating the substrate along a circular orbit and a thin-film deposition surface of the substrate rotating along the circular orbit. A thin-film deposition source that emits vaporized vaporized vapor-deposited material, which is located inside the circular orbit and at a position different from the center of the circular orbit when the circular orbit is viewed in a plan view. On the other hand, it is a substrate holder that holds the substrate in an inclined posture of the vapor deposition surface, and the substrate holder that rotates along the circular trajectory together with the substrate while keeping the posture in which the vapor deposition surface is inclined, and the vapor deposition source to the vapor deposition surface. It is a mask that shields a part of the heading steam, and is provided with a mask that rotates together with the substrate in a state where it is arranged at a position facing the thin-film deposition surface at intervals and the relative position with the thin-film deposition surface is fixed. .. [Selection diagram] Fig. 1