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Thin-film deposition pattern forming method, thin-film deposition pattern forming device, thin-film deposition mask with frame, and frame

机译:薄膜沉积图案形成方法,薄膜沉积图案形成装置,带框架的薄膜沉积掩模和框架

摘要

PROBLEM TO BE SOLVED: To provide a vapor deposition pattern formation method that can form a high-definition vapor deposition pattern with good yield, and to provide a vapor deposition pattern formation device, a vapor deposition mask with a frame and a frame.SOLUTION: A vapor deposition pattern formation method includes: using a vapor deposition mask 10 provided with an opening part corresponding to a pattern to be produced with vapor deposition; bringing the vapor deposition mask 10 close contact with a vapor deposition object 20; and causing a vapor deposition material discharged from a vapor deposition source to adhere to the vapor deposition object 20 through the opening part of the vapor deposition mask 10. The vapor deposition pattern formation method brings the vapor deposition object 20 into an intentionally warped state in a predetermined direction when bringing the vapor deposition mask 10 close contact with a vapor deposition object 20.SELECTED DRAWING: Figure 1
机译:要解决的问题:提供一种气相沉积图案形成方法,其可以形成具有良好产量的高清气相沉积图案,并提供气相沉积图案形成装置,具有框架的气相沉积掩模和框架。─ 气相沉积图案形成方法包括:使用具有与气相沉积产生的图案相对应的开口部分的气相沉积掩模10; 使气相沉积掩模10与气相沉积物体20紧密接触; 并使从气相沉积源排出的气相沉积材料通过气相沉积掩模10的开口部分粘附到气相沉积物体20上。气相沉积图案形成方法将气相沉积物体20带入A中的有意翘曲的状态 使气相沉积掩模10与气相沉积物体20紧密接触时的预定方向。选择图:图1

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