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TFT substrate including barrier layer including silicon oxide layer and silicon silicon nitride layer, Organic light-emitting device comprising the TFT substrate, and the manufacturing method of the TFT substrate

机译:TFT基板包括包括氧化硅层和氮氮化硅层的阻挡层,包括TFT基板的有机发光器件,以及TFT基板的制造方法

摘要

The present invention is a first plastic layer; a first barrier layer positioned on the first plastic layer; a first intermediate layer disposed on the first barrier layer and in direct contact with the first barrier layer; a second plastic layer located on the first intermediate layer and in direct contact with the first intermediate layer; an organic light emitting device positioned on the second plastic layer; and an encapsulation thin film encapsulating the organic light emitting device, wherein the first intermediate layer includes at least one of an amorphous material, a metal thin film, and a metal oxide thin film, and the thickness of the first plastic layer is the second plastic layer to provide an organic light emitting display device thicker than the thickness of
机译:本发明是第一塑料层;定位在第一塑料层上的第一阻挡层;设置在第一阻挡层上并与第一阻挡层直接接触的第一中间层;第二塑料层位于第一中间层上并与第一中间层直接接触;定位在第二塑料层上的有机发光装置;和封装有机发光器件的封装薄膜,其中第一中间层包括非晶材料,金属薄膜和金属氧化物薄膜中的至少一种,并且第一塑料层的厚度是第二塑料层提供比厚度厚的有机发光显示装置

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