A method of acquiring training data to train a model of a semiconductor manufacturing process

摘要

A method is provided for obtaining a training data set comprising synthetic metrology data, wherein the training data set is configured for training a model associated with a manufacturing process for manufacturing an integrated circuit. The method includes obtaining behavioral characteristic data describing the behavior of a process parameter resulting from a manufacturing process and/or an associated tool or influence. Additionally or alternatively, metrology data performed on structures formed by such and/or similar manufacturing processes may be obtained. Using the behavioral characteristic data and/or metrology data, synthetic metrology data is determined that describes the effect of variations in the manufacturing process and/or associated tools or influences on the process parameters. The model is trained using a training data set containing synthetic metrology data.