首页>
外国专利>
PROCESS FOR MANUFACTURING A RELAXED GAN/INGAN STRUCTURE
PROCESS FOR MANUFACTURING A RELAXED GAN/INGAN STRUCTURE
展开▼
机译:制造轻松的GaN / Ingan结构的过程
展开▼
页面导航
摘要
著录项
相似文献
摘要
A process comprising the following steps of: a) providing a device comprising: a GaN/InGaN structure comprising an electrically conductive doped GaN layer locally covered with InGaN mesas comprising a doped InGaN layer and an undoped or weakly doped InGaN layer, an electrically insulating layer covering the electrically conductive doped GaN layer between the mesas, b) connecting the electrically conductive doped GaN layer and a counter-electrode (500) to a voltage or current generator, c) dipping the device and the counter-electrode into an electrolyte solution, d) applying a voltage or current between the electrically conductive doped GaN layer and the second electrode to porosify the doped InGaN layer, e) forming an InGaN layer by epitaxy on the InGaN mesas, whereby a relaxed epitaxially grown InGaN layer is obtained.
展开▼