ROBUST MEMBRANE WITH HIGH PERMEABILITY FOR LITHOGRAPHIC EXTREME ULTRAVIOLET SYSTEMS

摘要

A robust membrane with high permeability for lithographic EUV systems (EUV: extreme ultraviolet) is disclosed. In one example, the present invention provides a membrane that includes a sheet and a frame that supports the sheet. The film can be produced from a transparent carbon-based layer and / or a transparent silicon-based layer. The transparent carbon-based layer and / or the transparent silicon-based layer can also be coated with a protective cover. The frame may have at least one hole to allow air to flow through a portion of the membrane.