首页> 外国专利> A photosensitive resin composition for black resist, a method for producing the photosensitive resin composition and a light-shielding film obtained by curing the photosensitive resin composition, a color filter and a touch panel having the light-shielding film, and a display device having the color filter and the touch panel.

A photosensitive resin composition for black resist, a method for producing the photosensitive resin composition and a light-shielding film obtained by curing the photosensitive resin composition, a color filter and a touch panel having the light-shielding film, and a display device having the color filter and the touch panel.

机译:用于黑色抗蚀剂的光敏树脂组合物,一种用于制造光敏树脂组合物的方法和通过固化光敏树脂组合物,滤色器和具有遮光膜的触摸板而获得的遮光膜,以及具有遮光膜的显示装置滤色器和触摸面板。

摘要

PROBLEM TO BE SOLVED: To provide a photosensitive resin composition for a black resist having high light-shielding property and low reflectance and capable of forming a high-definition pattern. A photosensitive resin composition for a black resist of the present invention comprises (A) an unsaturated group-containing photosensitive resin, (B) a photopolymerizable monomer having at least two or more unsaturated bonds, and (C). ) A photopolymerization initiator, (D) at least one light-shielding component selected from black pigments, color-mixing pigments and light-shielding materials, (E) silica particles, and (F) phosphoric acid ester-based dispersant. [Selection diagram] None
机译:要解决的问题:为黑色抗蚀剂提供具有高遮光性和低反射率的光敏树脂组合物,并且能够形成高清图案。用于本发明的黑色抗蚀剂的光敏树脂组合物包含(a)含不饱和基团的光敏树脂,(b)具有至少两个或更多个不饱和键的可光聚合的单体,和(c)。 )光聚合引发剂,(d)至少一种选自黑色颜料,色混颜料和遮光材料的遮光组分,(E)二氧化硅颗粒和(F)磷酸酯基分散剂。 [选择图]无

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