首页> 外文会议>The Ninth International Display Workshops (IDW '02) Dec 4-6, 2002 Hiroshima, Japan >Chemically Modified Carbon Black for the Resin Black Matrix in LCD Color Filters
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Chemically Modified Carbon Black for the Resin Black Matrix in LCD Color Filters

机译:LCD彩色滤光片中用于树脂黑底的化学改性炭黑

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摘要

The IPS mode of LCD requires a black matrix (BM) layer with high resistivity. Traditional Cr-based materials do not provide the required electrical properties and are harmful to the environment. Current resin based offerings have difficulty providing resistivity and opacity in a 1 μm film. We developed a method to produce dispersions of chemically modified carbon blacks (CB) which deliver volume resistivities in resin BM films suitable for IPS mode and other wide viewing angle technologies. The material also meets opacity requirements in 1 μm films. This BM material might also be used directly on the TFT layer.
机译:LCD的IPS模式需要具有高电阻率的黑矩阵(BM)层。传统的铬基材料不能提供所需的电性能,并且对环境有害。当前的基于树脂的产品难以在1μm的薄膜中提供电阻率和不透明度。我们开发了一种生产化学改性炭黑(CB)分散体的方法,该分散体在适合IPS模式和其他宽视角技术的树脂BM膜中提供体积电阻率。该材料还可以满足1μm薄膜的不透明度要求。该BM材料也可以直接用于TFT层上。

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