METHODS FOR DEPOSITING A MOLYBDENUM NITRIDE FILM ON A SURFACE OF A SUBSTRATE BY A CYCLICAL DEPOSITION PROCESS AND RELATED SEMICONDUCTOR DEVICE STRUCTURES INCLUDING A MOLYBDENUM NITRIDE FILM

摘要

A method of depositing a molybdenum nitride film on a surface of a substrate is disclosed. The method includes providing a substrate into a reaction chamber; And directly depositing a molybdenum metal film on the surface of the substrate by performing one or more unit deposition cycles of the periodic deposition process, wherein the unit deposition cycle includes contacting the substrate with a first vapor phase reactant including a molybdenum halide precursor; And contacting the substrate with a second gaseous reactant including a nitrogen precursor. A semiconductor device structure including a molybdenum nitride film is also disclosed.