Vacuum deposition of catalyst - from atomic dispersion produced by bombarding target with accelerated ions

摘要

A e.g. Pt catalyst, is deposited on an Alumina substrate; as an atomic dispersion, produced by bombarding a target with inert ions, e.g. Argon, accelerated, as produced by glow discharge between an anode and a Pt cathode. The target is orientated at 45 degrees To the ion beam, and the substrate is at right angles to the target. Equivalent activity is produced by a much lighter catalyst deposit, because agglomeration does not occur, as with vapour decomposition; and catalyst may be more selective, e.t. in producing higher proportions of butenes, in butane from butadiene hydrogenation. The substrate may be of known extended surface type, or may comprise e.g. alumina crystals, continuously reoriented by vibration, e.g. on the diaphragm of a loud-speaker.