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GOLD PLATING LIQUID AND GOLD PLATING METHOD FOR USING GOLD PLATING LIQUID

机译:镀金液及使用镀金液的镀金方法

摘要

PURPOSE:To form a metal plating layer presenting golden semi-luster, by carrying out plating on the substrate by using gold plating liquid containing gold cyanide complex ion, conductive salt and a fixed amount of rare earth elements or moreover, using a fixed pulse electric current. CONSTITUTION:In case of carrying out gold plating of semiconductor parts substrate, etc., such as transistor header, etc., pure gold deposit having uniform golden semi-luster and contenting desirable gold plating characteristics, is formed by using gold plating liquid containing gold cyanide complex salt, such as gold cyanide potassium and moreover, containing conductive salt such as acetic acid, etc. and 1-200g/l of rare earth elements such as cerium sulphate, etc. or using the above plating liquid and also carrying out gold plating by using pulse wavy direct current having a period of 100-10,000Hz and ON and OFF time being the ratio of ON and OFF time 1:1-1:10.
机译:用途:通过使用包含固定氰化物金离子,导电盐和固定量稀土元素的镀金液,并使用固定脉冲电法在基底上进行镀覆,以形成呈现金色半光泽的金属镀层当前。组成:在对半导体零件基板等(例如晶体管接头等)进行镀金的情况下,使用含金的镀金液可形成具有均匀的金色半光泽并具有令人满意的镀金特性的纯金沉积物氰化物金盐等氰化物络合物盐,还含有乙酸等导电盐和硫酸铈等稀土元素1-200g / l,或者使用上述电镀液,也可制金通过使用周期为100-10,000Hz的脉冲波形直流电进行镀覆,导通和关断时间为导通和关断时间之比为1:1-1:10。

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