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Resolution manner null of freon

机译:解决办法氟利昂

摘要

PURPOSE:To enable decomposing fluorocarbons and halons efficiently at a comparatively low temperature by using various catalysts under plasma discharge to effect reaction with water vapor. CONSTITUTION:Low frequency discharge, high frequency discharge, microwave discharge, etc., are used as plasma discharge, and inert gases such as nitrogen, argon and helium are desirable as atmospheric gas other than reaction gases and air, etc., can be used too. A catalyst to be used may be any of nickel type, titania type, chromium oxide type, alumina type and palladium type catalysts, etc., so as not to be limited but a catalyst having halogen resisting properties is desirable because hydrogen fluoride and hydrogen chloride are generated as reaction products. 1.5g of titania-zirconia type catalyst 5 is placed in a bell- jar type reactor 3 equipped with a plasma generation power supply and electrode, CFC-113 and water vapor are injected so as to be 400ppm and 3000ppm in 1.2Torr of nitrogen, respectively, and a decomposition reaction is caused to take place under plasma discharge.
机译:目的:通过在等离子体放电下使用各种催化剂与水蒸气进行反应,以在较低的温度下有效分解碳氟化合物和哈龙。组成:等离子体放电使用低频放电,高频放电,微波放电等,除了反应气体和空气等,还可以使用氮气,氩气和氦气等惰性气体作为大气太。所用的催化剂可以是镍型,二氧化钛型,氧化铬型,氧化铝型和钯型催化剂中的任何一种,以便不受限制,但由于氟化氢和氯化氢,具有抗卤素性能的催化剂是理想的。作为反应产物生成。将1.5g二氧化钛-氧化锆型催化剂5放入装有等离子体产生电源和电极的钟罩型反应器3中,注入CFC-113和水蒸气,使其在1.2Torr的氮气中分别为400ppm和3000ppm,分别在等离子体放电下引起分解反应。

著录项

  • 公开/公告号JPH0669499B2

    专利类型

  • 公开/公告日1994-09-07

    原文格式PDF

  • 申请/专利权人 東和科学株式会社;

    申请/专利号JP19910050533

  • 发明设计人 水江 安次郎;瀬戸 覚;山崎 恒博;

    申请日1991-02-22

  • 分类号A62D3/00;B01D53/34;B01J19/08;B01J21/06;B01J27/12;

  • 国家 JP

  • 入库时间 2022-08-22 04:54:33

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