首页> 外国专利> Plasma resolution device and resolution manner null of freon or

Plasma resolution device and resolution manner null of freon or

机译:氟利昂或氟利昂的血浆分离装置和分离方式

摘要

PROBLEM TO BE SOLVED: To subject fluorocarbon or fluorine compd. to plasma decomposition with high decomposition efficiency and to completely suppress the generation of harmful by-product. ;SOLUTION: Relating to the low temp. plasma decomposition device, the waste gas containing the fluorocarbon or the fluorine compd. is decomposed to a harmless material by causing the gas to flow between both electrodes 1 and 2 to which high voltage is applied. In the low temp. plasma decomposition device, a granular ferroelectric material 3 is filled between both electrodes 1 and 2 and also alumina coating layers are provided respectively at the opposite surface side of the both electrodes 1 and 2.;COPYRIGHT: (C)2001,JPO
机译:解决的问题:对碳氟化合物或氟化合物进行处理。等离子体分解具有很高的分解效率,并完全抑制了有害副产物的产生。 ;解决方案:与低温有关。在等离子体分解装置中,废气中含有碳氟化合物或氟化合物。通过使气体在施加有高电压的两个电极1和2之间流动,气体分解成无害的材料。在低温下。等离子分解装置,在两个电极1和2之间填充有颗粒状铁电材料3,并且在两个电极1和2的相对表面侧分别设置有氧化铝涂层; COPYRIGHT:(C)2001,JPO

著录项

相似文献

  • 专利
  • 外文文献
  • 中文文献
获取专利

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号