COMPOSITE HARD FILM OF TI-SI-N SYSTEM AND ITS PRODUCTION

摘要

PURPOSE: To form the composite hard film of a Ti-Si-N system which has the high adhesion to a base material, withstands bending and exhibits high hardness. ;CONSTITUTION: An evaporating source material having a compsn. Ti_aSi_b (where 75at%≤a≤85at%, 15at%≤b≤25at% and a+b=100at.%) is used and while the supply rate of a reactive gas of a nitrogen system is controlled to be kept constant under a partial nitrogen pressure or to be changed continuously or stepwise, the formation of the film on a base material is executed in an inert gaseous atmosphere contg. a prescribed amt. of the reactive gas by a sputtering method or ion plating method. The film having the uniform compsn. uniformly dispersed with the TiN crystalline particulates in an amorphous metal metal base phase of a Ti-Si system or the structurally graded film in which the ratio of the TiN crystalline particles dispersed in the amorphous metal base phase increases in the film thickness direction and changes from the amorphous metal to crystalline ceramic continuously or stepwise is obtd.;COPYRIGHT: (C)1994,JPO&Japio