Semiconductor wafer cleaning appts. associated with prod. cassette - handles wafers set upright in portable rack for mechanised transport between isopropyl alcohol cleaning and drying stations

摘要

The appts. is divided into five areas for loading/unloading, prod. insertion/extn., cleaning, rinsing and drying. Wafers (1) to be cleaned are stowed in the prod. cassette (4) for insertion into the loading/unloading area from which the cassette is moved by robot to the prod. insertion/extn. area. Each wafer standing upright in a groove (31c) is lifted (31b) into a rack (35) for transfer to the cleaning, rinsing and drying areas in turn. ADVANTAGE - Smaller appts. Prevents chemical haze from cleaning area and vapour from drying area polluting system itself or clean-room.