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Method and appertaining pair of mask patterns for fabricating, with the application of double masking, integrated optical waveguide structures
Method and appertaining pair of mask patterns for fabricating, with the application of double masking, integrated optical waveguide structures
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机译:利用双重掩膜的集成光波导结构的制造方法及相应的成对掩膜图形
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摘要
An alignment-tolerant fabrication of a waveguide structure having a symmetrical component structure and an asymmetrical component structure such as an asymmetrical X junction, with the aid of the technique of double masking is presented. The entire waveguide structure is defined by two different mask patterns (p.sub.1, p.sub.2) which are applied successively and in a mutually overlapping position. The two mask patterns are aligned with respect to one another according to alignment directions parallel (z-axis) and perpendicular (x-axis) to the axis of symmetry of the symmetrical component structure. Each mask pattern comprises a first asymmetrical component pattern (32;35) and a second asymmetrical component pattern (31,33; 34,36). The first component patterns (32 and 35) each define a separate portion of the asymmetrical component structure. The second component patterns ((31,33) and (34,36)) are mirror images of one another and comprise component shapes (33;36) which depend on a predefined alignment accuracy (w.sub.1) in the alignment direction perpendicular (x-axis) to the axis of symmetry.
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