首页> 外国专利> STRONTIUM-BISMUTH-TANTALUM-OXYGEN DIELECTRIC SUBSTANCE, THIN FILM OF DIELECTRIC SUBSTANCE, COMPOSITION FOR FORMING THIN FILM AND PRODUCTION OF THE THIN FILM

STRONTIUM-BISMUTH-TANTALUM-OXYGEN DIELECTRIC SUBSTANCE, THIN FILM OF DIELECTRIC SUBSTANCE, COMPOSITION FOR FORMING THIN FILM AND PRODUCTION OF THE THIN FILM

机译:锶-铋-钽-氧介电物质,介电物质薄膜,薄膜形成组合物和薄膜的生产

摘要

PURPOSE: To obtain a dielectric substance which has a large remanence value without fatigue in its film layer by specifying its composition to a unit comprising Sr-Bi-Ta-O. ;CONSTITUTION: An Sr-Ti-Ta-O dielectric substance which comprises a complex oxide of Sr-Bi-Ta, is represented by the formula where 0x1 and (y) represents the total of oxygen atoms following each of the metals. This dielectric substance is obtained by exchanging a part of Sr with Bi in order to increase the ferroelectric properties of conventional SrBi2O9, and shows an increased remanence value and a reduced film layer fatigue. The dielectric substance is preferably used as a thin film layer of 10nm-1μm, more preferably 80-800nm. The film layer thinner than 10nm is different to keep satisfactory insulation, while thicker than 1μm roughens the surface because of excessively large grain growth. The ferroelectric material is used as a semiconductor memory to give excellent devices free from film layer fatigue.;COPYRIGHT: (C)1996,JPO
机译:用途:通过将其组成规定为包含Sr-Bi-Ta-O的单元,可获得具有较大剩磁值且在其膜层中无疲劳的介电物质。组成:由Sr-Bi-Ta的复合氧化物组成的Sr-Ti-Ta-O介电物质由下式表示:其中0 2 O 9 的铁电性能,通过将一部分Sr与Bi交换获得了这种介电物质,并显示出增加的剩磁值和降低的剩磁值。薄膜层疲劳。介电物质优选用作10nm-1μm,更优选80-800nm的薄膜层。小于10nm的薄膜层不同,以保持令人满意的绝缘性,而大于1μm的薄膜层则由于晶粒过大而使表面粗糙。铁电材料用作半导体存储器,以提供不受膜层疲劳影响的优良器件。;版权所有:(C)1996,JPO

著录项

  • 公开/公告号JPH08319160A

    专利类型

  • 公开/公告日1996-12-03

    原文格式PDF

  • 申请/专利权人 MITSUBISHI MATERIALS CORP;

    申请/专利号JP19950122423

  • 发明设计人 ATSUGI TSUTOMU;YONEZAWA MASA;OGI KATSUMI;

    申请日1995-05-22

  • 分类号C04B35/495;C01G35/00;C23C14/08;H01B3/12;

  • 国家 JP

  • 入库时间 2022-08-22 03:31:14

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