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Method of manufacturing microstructure pattern of molecular material high orientation aggregate with the aid of difference of growth rate by substrate material

机译:借助于衬底材料的生长速率差异来制造分子材料高取向聚集体的微结构图案的方法

摘要

The present invention aims to provide a method of manufacturing a microstructure pattern of a high orientation aggregate of organic molecular material by forming a fine pattern made by single crystal growing ionic material of another property on an ionic substrate by lithography and epitaxial growth, and forming a pattern made by organic molecular material having functionability to light on the fine pattern by utilizing dependence of substrate material of crystal growth rate in epitaxial growth, and is applied to the formation of a microstructure pattern of organic molecular material which can be utilized for optical waveguide, optical integrated circuit, non-linear optical element and laser resonator.
机译:本发明的目的在于提供一种通过光刻和外延生长在离子基板上形成由具有其他性质的离子材料的单晶生长而成的微细图案,并形成有机分子材料的高取向聚集体的微结构图案的方法,该微细图案由单晶生长的另一种性质的离子材料制成。通过利用外延生长中的晶体生长速率对衬底材料的依赖性,由具有对微细图案具有光功能的有机分子材料制成的图案,并应用于形成可用于光波导的有机分子材料的微结构图案,光学集成电路,非线性光学元件和激光谐振器。

著录项

  • 公开/公告号US5738720A

    专利类型

  • 公开/公告日1998-04-14

    原文格式PDF

  • 申请/专利权人 THE UNIVERSITY OF TOKYO;

    申请/专利号US19960600157

  • 发明设计人 ATSUSHI KOMA;TOSHIHIRO SHIMADA;

    申请日1996-02-12

  • 分类号C30B29/58;

  • 国家 US

  • 入库时间 2022-08-22 02:39:49

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