Formation manner of orientation Characteristic thin film pattern, formation manner of thin film component of orientation Characteristic thin film pattern and thin film array ultrasonic converter

摘要

A thin film pattern and a method of fabricating the thin film pattern available for an ultrasonic transducer are disclosed. That is and an oriented thin film (2) made of a material different from the material of a substrate (1) is formed ON the substrate, a mask (3 and 4) having a predetermined pattern is formed ON the thin film, and anisotropic etching is carried out for the thin film in accordance with the predetermined pattern of the mask, by using an etchant for selectively etching a predetermined crystallographic plane parallel to the surface of the thin film, to form the predetermined pattern in the thin film and thereby obtaining a thin film pattern.