Lazy dislocation observation sheet of semiconductor wafer and Lazy dislocation observation method of semiconductor wafer using the same

摘要

The present invention relates to a lazi dislocation observation sheet for a semiconductor wafer and a lazi dislocation observation method for a semiconductor wafer using the same. In the present invention, observation cells at regular intervals are observed when the large wafer dislocations are observed. The semiconductor wafer is rotated at an angle to match the observation cell as well as the lazy dislocation observation sheet having the opening thereof. Firstly, the status of the lazi dislocations existing on a certain surface of the wafer can be easily identified. Second, the quality of the final wafer can be significantly improved by ensuring that appropriate measures are taken depending on the cause of the large dislocation.