首页> 外国专利> FIELD EMISSION ELECTRON GUN CAPABLE OF MINIMIZING NONUNIFORM INFLUENCE OF SURROUNDING ELECTRIC POTENTIAL CONDITION ON ELECTRONS EMITTED FROM EMITTERS

FIELD EMISSION ELECTRON GUN CAPABLE OF MINIMIZING NONUNIFORM INFLUENCE OF SURROUNDING ELECTRIC POTENTIAL CONDITION ON ELECTRONS EMITTED FROM EMITTERS

机译:最小化场电势的场发射电子枪对电子发射器周围电子势条件的影响

摘要

On the insulating film to surround the emitter 104 formed on the predetermined portion of the substrate, the insulating film 105 formed on the remaining portion of the substrate, and the emitter having a space between each emitter and the first gate electrode 101. And a first voltage formed on the insulating film to surround the first gate electrode 101, to which the first voltage is applied, and the outer circumferential surface of the first gate electrode having a gap between the outer circumferential surfaces of the first gate electrode and the second gate electrode. In the field emission electron gun including the second gate electrode 102 to which a second less voltage is applied, the emitter is formed on the substrate except for the central portion of the substrate. The first gate electrode has an inner circumferential surface forming a hole 107 exposing a central portion of the insulating film positioned on the central portion of the substrate. The third gate electrode 106 may be formed on a central portion of the insulating layer having a third voltage less than the first voltage and having a different distance between the inner circumferential surface of the first gate electrode and the third gate electrode.
机译:在绝缘膜上以包围形成在基板的预定部分上的发射极104的方式,在基板的其余部分上形成绝缘膜105,并且该发射极在每个发射极和第一栅电极101之间具有空间。形成在绝缘膜上的电压,以包围施加有第一电压的第一栅电极101,并且第一栅电极的外周表面在第一栅电极和第二栅电极的外周表面之间具有间隙。在包括第二栅电极102的场发射电子枪中,第二栅电极102被施加了第二较小的电压,除了衬底的中心部分之外,在衬底上形成发射极。第一栅电极具有形成孔107的内周表面,该孔107暴露位于基板的中央部分上的绝缘膜的中央部分。第三栅电极106可以形成在具有小于第一电压的第三电压并且在第一栅电极的内周表面与第三栅电极之间具有不同距离的绝缘层的中央部分上。

著录项

  • 公开/公告号KR100230116B1

    专利类型

  • 公开/公告日1999-11-15

    原文格式PDF

  • 申请/专利权人 NEC CORPORATION;

    申请/专利号KR19970013955

  • 发明设计人 오카모토 아키히코;

    申请日1997-04-16

  • 分类号H01J9/02;

  • 国家 KR

  • 入库时间 2022-08-22 01:46:25

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