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Thin film formation manner null of thin film formation device and pot and sublimation Characteristic evaporation material for its evaporation source
Thin film formation manner null of thin film formation device and pot and sublimation Characteristic evaporation material for its evaporation source
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机译:薄膜形成装置和罐的薄膜形成方式无效及升华为其蒸发源的特征蒸发材料
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摘要
PURPOSE: To provide a thin film forming device by which a film is stably formed at a high rate. ;CONSTITUTION: A crucible 31 is formed with an outer crucible 32 housing an inner crucible 33 contg. a vaporization material 14 and a bottom lid 34 screwed in the outer crucible. The outer crucible 32 consists of a hollow cylindrical vaporization material storage part 32a and an oval injection nozzle setting part 32b projecting from the storage part. Plural conical injection nozzles 13 are provided to the nozzle setting part 32b. A heating filament 15 is set around the crucible 31 at a specified distance from the storage part 32a and the peripheral wall of the nozzle setting part 32b to surround the crucible 31.;COPYRIGHT: (C)1995,JPO
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