首页> 外国专利> Process for microstructuring plastic which is sensitive to X-rays comprises applying plastic layer to conducting surface of a substrate, partially radiating, selectively removing radiated regions and applying layer of conducting carbon

Process for microstructuring plastic which is sensitive to X-rays comprises applying plastic layer to conducting surface of a substrate, partially radiating, selectively removing radiated regions and applying layer of conducting carbon

机译:微结构化对X射线敏感的塑料的方法包括:将塑料层施加到基板的导电表面上,部分辐射,选择性地除去辐射区域,然后施加导电碳层

摘要

Process for microstructuring a plastic which is sensitive to X-rays comprises applying a layer of plastic to the conducting surface of a substrate, partially radiating the plastic layer via a mask producing irradiated and non-radiated regions, selectively removing the radiated regions by chemical dissolution, and providing the substrate with a layer of conducting carbon having a conducting surface.
机译:微结构化对X射线敏感的塑料的方法包括:在基材的导电表面上涂覆一层塑料,通过掩模部分辐射塑料层,从而产生辐射区和非辐射区,通过化学溶解选择性地去除辐射区并为基板提供具有导电表面的导电碳层。

著录项

相似文献

  • 专利
  • 外文文献
获取专利

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号