193 - Hydroxy-amino thermally cured undercoat for 193nm lithography
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机译:193-用于193nm光刻的羟基氨基热固化底涂层
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摘要
The present invention relates to a heat curable polymer composition comprising a hydroxyl containing polymer, an amino crosslinker and a thermal acid generator and a photolithographic substrate coated with such a composition. The thermally curable polymer composition can be dissolved in a solvent and used as a primer layer in deep ultraviolet lithography.
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