首页> 外国专利> Training model for pattern recognition, especially Hidden-Markov model, involves defining displacement between related training patterns by correlating patterns so that correlation is maximal

Training model for pattern recognition, especially Hidden-Markov model, involves defining displacement between related training patterns by correlating patterns so that correlation is maximal

机译:模式识别的训练模型,尤其是Hidden-Markov模型,涉及通过关联模式定义相关训练模式之间的位移,从而最大程度地提高相关性

摘要

The method involves defining a displacement value representing the displacement between at least two related training patterns (11,13) by correlating the two training patterns so that the correlation is maximal. The training patterns are shifted with respect to each other so that corresponding regions of the patterns have approximately the same length relative to a common reference point. AN Independent claim is also included for the following: a pattern recognition arrangement for implementing the method.
机译:该方法包括通过使两个训练模式相关以使相关性最大来定义代表至少两个相关训练模式(11,13)之间的位移的位移值。训练模式相对于彼此移动,使得模式的相应区域相对于公共参考点具有大约相同的长度。还包括以下内容的独立权利要求:用于实施该方法的模式识别装置。

著录项

  • 公开/公告号DE10122212C1

    专利类型

  • 公开/公告日2002-10-10

    原文格式PDF

  • 申请/专利权人 SIEMENS AG;

    申请/专利号DE2001122212

  • 发明设计人 TSCHIRK WOLFGANG;STERZ WALTER;

    申请日2001-05-08

  • 分类号G10L15/06;G06K9/66;G10L15/14;

  • 国家 DE

  • 入库时间 2022-08-22 00:26:58

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