首页> 外国专利> METHOD OF MANUFACTURING MEMBRANE SAMPLE FOR SCANNING TRANSMISSION ELECTRON MICROSCOPE AND OBSERVATION METHOD FOR MEMBRANE SAMPLE METHOD FOR MEMBRANE SAMPLE

METHOD OF MANUFACTURING MEMBRANE SAMPLE FOR SCANNING TRANSMISSION ELECTRON MICROSCOPE AND OBSERVATION METHOD FOR MEMBRANE SAMPLE METHOD FOR MEMBRANE SAMPLE

机译:扫描透射电子显微镜的膜样品的制备方法和膜样品的观察方法膜样品的方法

摘要

PROBLEM TO BE SOLVED: To realize a method of manufacturing a membrane sample for a scanning transmission electron microscope which is suitable for being used in the inspection of a multilayer structure in a semiconductor device and which is handled easily, and to realize an observation method for the membrane sam ple. SOLUTION: A prescribed part is shaved by an ion beam, and the membrane sample M which is parallel to a fault 16 is manufactured. A hole 17 is opened by an ion beam in a region R3 at the inside of the cut fault 16, the side face of the hole 17 is worked vertically in a membrane M, a face facing the membrane part M is worked obliquely in such a way that the area of the opening of the hole becomes larger than the area of the bottom of the hole, and a slope 18 is formed. A region R4 on the side of the fault 16 in the membrane M is cut precisely by an ion beam in order to increase the accuracy of the thickness of the membrane sample. The slope 18 of the hole 17 is coated with a material whose secondary-electron generation efficiency is high.
机译:解决的问题:实现一种用于扫描透射电子显微镜的膜样品的制造方法,该方法适用于半导体器件中的多层结构的检查并且易于处理,并且实现一种用于观察的方法。膜样品解决方案:用离子束刮除规定的部分,然后制造平行于断层16的膜样品M。在切割断层16的内侧的区域R3中,通过离子束开有孔17,该孔17的侧面在膜M上垂直地加工,与膜部M相对的面以这种方式倾斜地加工。这样,孔的开口面积变得比孔的底部面积大,并形成了斜面18。膜M中的断层16侧上的区域R4被离子束精确地切割,以增加膜样品的厚度的精度。孔17的斜面18覆盖有二次电子产生效率高的材料。

著录项

  • 公开/公告号JP2003004667A

    专利类型

  • 公开/公告日2003-01-08

    原文格式PDF

  • 申请/专利权人 JEOL LTD;

    申请/专利号JP20010184683

  • 发明设计人 NEGISHI TSUTOMU;

    申请日2001-06-19

  • 分类号G01N23/04;G01N1/28;G01N23/225;H01J37/20;H01J37/28;

  • 国家 JP

  • 入库时间 2022-08-22 00:12:31

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