Nozzle Installation Structure of Semiconductor Low Pressure Chemical Vapor Deposition Equipment

摘要

The present invention relates to a nozzle installation structure of a semiconductor low pressure chemical vapor deposition apparatus, and in the related art, the inclination of the long nozzle provided on one inner side of the inner tube is generated, and there is a problem of being damaged by contact with the boat. The semiconductor low pressure chemical vapor deposition apparatus of the present invention forms long nozzle evacuation grooves 40 in the up and down directions on the inner surface of the inner tube 22, and inserts the long nozzle 25 in the long nozzle evacuation grooves 40. By fixing, the long nozzle is prevented from being inclined and hitting the boat during the process, thereby preventing the long nozzle from being damaged.