首页>
外国专利>
POLICE ISSUES AND PROCEDURES FOR THE MANUFACTURE OF POLICE ISSUES WITH LONG-TERM MICROSSELS
POLICE ISSUES AND PROCEDURES FOR THE MANUFACTURE OF POLICE ISSUES WITH LONG-TERM MICROSSELS
展开▼
机译:带有长期MICROSSEL的警察问题的警察程序和程序
展开▼
页面导航
摘要
著录项
相似文献
摘要
A polishing pad for use in chemical-mechanical planarization (CMP) of semiconductor wafers includes a multiplicity of elongated microcolumns embedded in a matrix material body. The elongated microcolumns are oriented parallel to each other and extend from a planarizing surface used to planarize the semiconductor wafers. The elongated microcolumns are uniformly distributed throughout the polishing pad in order to impart uniform properties throughout the polishing pad. The polishing pad can also include elongated pores either coaxial width or interspersed between the elongated microcolumns to provide uniform porosity throughout the polishing pad.
展开▼