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METHOD FOR MANUFACTURING CRYSTALLINE THIN FILM OF DIAMOND BY PULSE LASER BEAM VAPOR DEPOSITION, AND THIN FILM MANUFACTURED BY THE METHOD
METHOD FOR MANUFACTURING CRYSTALLINE THIN FILM OF DIAMOND BY PULSE LASER BEAM VAPOR DEPOSITION, AND THIN FILM MANUFACTURED BY THE METHOD
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机译:脉冲激光束气相沉积制备金刚石晶体薄膜的方法及该方法制得的薄膜
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摘要
PROBLEM TO BE SOLVED: To provide a method for manufacturing a crystalline thin film of diamond such as a hetero-epitaxial thin film, and to provide a thin film manufactured by the method.;SOLUTION: In the method for manufacturing a crystalline thin film, an epitaxial, a uniaxially oriented, or a polycrystalline thin film of diamond is formed on a monocrystalline substrate made of sapphire, SrTiO3, or the like other than diamond, which do not react with SiC and a substrate holder, by using an SiC target, using a substrate heating mechanism capable of heating the substrate to such a high temperature as in the region of 1,000°C, and using a film forming method employing a pulse laser abrasion method applying a pulse laser having a pulse width shorter than sub-nanosecond. A hetero-epitaxial thin film, a uniaxially oriented thin film, and a polycrystalline thin film of diamond are manufactured on the surfaces of those substrates by using the method for manufacturing the crystalline thin film.;COPYRIGHT: (C)2004,JPO&NCIPI
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